Dr. Christoph Noelscher Profile

Dr. Christoph Noelscher

Senior Staff Expert at Carl Zeiss SMT AG

SPIE Involvement:

Author

Publications (18)

SPIE Journal Paper | 1 January 2009

Double patterning down to k₁=0.15 with litho trim

Christoph Noelscher, Marcel Heller, Matthias Markert, Dietmar Temmler, Franck Jauzion-Graverolle, Nicolo Morgana, Ulrich Scheler, Bee-Kim Hong, Ulrich Egger, Vadim Timoshkov, Mirko Vogt

JM3 Vol. 8 Issue 01

KEYWORDS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon

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Proceedings Article | 2 May 2008 Paper

Assessment and application of focus drilling for DRAM contact hole fabrication

Christoph Noelscher, Franck Jauzion-Graverolle, Thomas Henkel

Proc. SPIE. 6792, 24th European Mask and Lithography Conference

KEYWORDS: Chromatic aberrations, Lithography, Calibration, Scanners, Colorimetry, Photomasks, Optical fiber cables, Computer aided design, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 1 April 2008 Paper

AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer

Proc. SPIE. 6924, Optical Microlithography XXI

KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

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Proceedings Article | 7 March 2008 Paper

Double patterning down to k1=0.15 with bilayer resist

Christoph Noelscher, Franck Jauzion-Graverolle, Marcel Heller, Matthias Markert, Bee-Kim Hong, Ulrich Egger, Dietmar Temmler

Proc. SPIE. 6924, Optical Microlithography XXI

KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, 193nm lithography

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Proceedings Article | 30 October 2007 Paper

EMF simulations of isolated and periodic 3D photomask patterns

Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Bernd Küchler, Christoph Nölscher

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Optical lithography, Light scattering, Chromium, Computer simulations, Near field, Finite element methods, Photomasks, Critical dimension metrology, Chemical elements, Electromagnetism

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Proceedings Article | 18 June 2007 Paper

3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method

Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Thomas Henkel, Bernd Küchler, Christoph Nölscher

Proc. SPIE. 6617, Modeling Aspects in Optical Metrology

KEYWORDS: Nanostructures, Diffraction, Optical lithography, Etching, Computer simulations, Finite element methods, Photomasks, Chemical elements, Electromagnetism, Radio propagation

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Proceedings Article | 26 March 2007 Paper

Optimal SRAF placement for process window enhancement in 65-nm/45-nm technology

Chandra Sarma, Klaus Herold, Christoph Noelscher, Paul Schroeder

Proc. SPIE. 6520, Optical Microlithography XX

KEYWORDS: Lithography, Logic, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Tolerancing, Standards development

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Proceedings Article | 20 October 2006 Paper

Rigorous simulation of 3D masks

Sven Burger, Roderick Köhle, Lin Zschiedrich, Hoa Nguyen, Frank Schmidt, Reinhard März, Christoph Nölscher

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Lithography, Diffraction, Polarization, Image processing, Computer simulations, Finite element methods, Photomasks, Chemical elements, Photoresist processing, Airborne remote sensing

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Proceedings Article | 5 November 2005 Paper

Comparative study of simulations and experiments for contact array patterns on attenuated phase shifting mask

Thomas Henkel, Martin Sczyrba, Christoph Noelscher

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Phase shifting, 3D acquisition, Calibration, Scanners, Error analysis, 3D modeling, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 5 November 2005 Paper

Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation

Sven Burger, Roderick Köhle, Lin Zschiedrich, Weimin Gao, Frank Schmidt, Reinhard März, Christoph Nölscher

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Diffraction, Finite-difference time-domain method, Waveguides, Polarization, Computer simulations, Solids, Finite element methods, Photomasks, Chemical elements

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SPIE Journal Paper | 1 October 2005

New stochastic post-exposure bake simulation method

Thomas Mülders, Wolfgang Henke, Klaus Elian, Christoph Nölscher, Michael Sebald

JM3 Vol. 4 Issue 04

KEYWORDS: Molecules, Stochastic processes, Diffusion, Particles, Computer simulations, Line edge roughness, Printing, Process modeling, Solids, Computing systems

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Proceedings Article | 14 May 2004 Paper

Methodology and practical application of an ArF resist model calibration

Ralf Ziebold, Bernd Kuchler, Christoph Nolscher, Martin Robiger, Klaus Elian, Bernd Tollkuhn

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Lithography, Diffractive optical elements, Data modeling, Calibration, Diffusion, Computer simulations, 3D modeling, Photomasks, Optimization (mathematics), Semiconducting wafers

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Proceedings Article | 14 May 2004 Paper

Do we need complex resist models for predictive simulation of lithographic process performance?

Bernd Tollkuhn, Andreas Erdmann, Jeroen Lammers, Christoph Nolscher, Armin Semmler

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Data modeling, Calibration, Diffusion, Finite element methods, Photomasks, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Photoresist processing, Semiconducting wafers

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Proceedings Article | 14 September 2001 Paper

Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks

Armin Semmler, Leonhard Mader, Annika Elsner, Roderick Koehle, Uwe Griesinger, Christoph Noelscher

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Lithography, Phase shifting, Etching, Manufacturing, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Information operations, Phase shifts

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Proceedings Article | 14 September 2001 Paper

Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification

Armin Semmler, Annika Elsner, Roderick Koehle, Leonhard Mader, Rainer Pforr, Christoph Noelscher, Christoph Friedrich, Juergen Knobloch, Uwe Griesinger

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Lithography, Diffraction, Phase shifting, Optical lithography, 3D metrology, Photomasks, Optical proximity correction, 3D image processing, Resolution enhancement technologies, Phase shifts

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Proceedings Article | 22 January 2001 Paper

Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification

Uwe Griesinger, Leonhard Mader, Armin Semmler, Wolfgang Dettmann, Christoph Noelscher, Rainer Pforr

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Calibration, Etching, Quartz, Error analysis, Chromium, Profiling, 3D metrology, Photomasks, Phase measurement, Phase shifts

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Proceedings Article | 1 July 1991 Paper

Investigation of self-aligned phase-shifting reticles by simulation techniques

Christoph Noelscher, Leonhard Mader

Proc. SPIE. 1463, Optical/Laser Microlithography IV

KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Solids, Lab on a chip, Photomasks, Critical dimension metrology, Tolerancing, Phase shifts

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Proceedings Article | 1 June 1991 Paper

Application aspects of the Si-CARL bilayer process

Michael Sebald, Joerg Berthold, Michael Beyer, Rainer Leuschner, Christoph Noelscher, Ulrich Scheler, Recai Sezi, Hellmut Ahne, Siegfried Birkle

Proc. SPIE. 1466, Advances in Resist Technology and Processing VIII

KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Silicon, Oxygen, Photoresist processing, Semiconducting wafers, Plasma, Picture Archiving and Communication System

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Showing 5 of 18 publications

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