Dr. Christophe Hecquet Profile

Dr. Christophe Hecquet

at Institut Fresnel

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Author

Publications (11)

Proceedings Article | 17 November 2017 Open Access

Multispectral filters assemblies for earth remote sensing imagers

R. Le Goff, H. Krol, C. Grèzes-Besset, M. Lequime, T. Bégou, C. Hecquet, M. Zerrad, B. Badoil, G. Montay, K. Gasc

Proceedings Volume 10563, 1056305 (2017) https://doi.org/10.1117/12.2304107

KEYWORDS: Semiconducting wafers, Optical filters, Glasses, Sensors, Optical coatings, Manufacturing, Transmittance, Astronomical imaging, Charge-coupled devices, Remote sensing

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Proceedings Article | 17 November 2017 Open Access

Optical filters for UV to near IR space applications

T. Begou, H. Krol, Christophe Hecquet, C. Bondet, J. Lumeau, C. Grèzes-Besset, M. Lequime

Proceedings Volume 10563, 1056306 (2017) https://doi.org/10.1117/12.2304155

KEYWORDS: Optical filters, Ultraviolet radiation, Optical filtering, Sputter deposition, Astronomical imaging, Plasma, Refractive index, Glasses, Light scattering, Niobium

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Proceedings Article | 2 October 2015 Paper

Analysis of energy deposition and damage mechanisms in single layer optical thin films irradiated by IR and UV femtosecond pulses

Dam Bé Douti, Laurent Gallais, Christophe Hecquet, Thomas Bégou, Julien Lumeau, Mireille Commandré

Proceedings Volume 9627, 962718 (2015) https://doi.org/10.1117/12.2192983

KEYWORDS: Thin films, Ultraviolet radiation, Laser damage threshold, Laser induced damage, Absorption, Silica, Ions, Ionization, UV optics, Femtosecond phenomena

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Proceedings Article | 31 October 2014 Paper

In-line quantitative phase imaging for damage detection and analysis

Dam-Bé Douti, Sherazade Aknoun, Serge Monneret, Christophe Hecquet, Mireille Commandré, Laurent Gallais

Proceedings Volume 9237, 92371A (2014) https://doi.org/10.1117/12.2068178

KEYWORDS: Digital image correlation, Cameras, Laser induced damage, Phase imaging, Sensors, Laser damage threshold, Microscopes, Damage detection, Interferometry, Refractive index

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Proceedings Article | 31 October 2014 Paper

UV to IR laser damage of Magnetron Sputtering films submitted to multiple sub-picosecond pulses

Dam-Bé Douti, Christophe Hecquet, Thomas Bégou, Mireille Commandré, Laurent Gallais

Proceedings Volume 9237, 92370I (2014) https://doi.org/10.1117/12.2068176

KEYWORDS: Silica, Sputter deposition, Ultraviolet radiation, Laser induced damage, Refractive index, Laser damage threshold, Infrared lasers, Thin films, Neodymium, Plasma

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Proceedings Article | 4 December 2012 Paper

Characterization of scratches on fused silica optics and a way to remove them

P. Cormont, T. Corbineau, Laurent Gallais, C. Hecquet, Laurent Lamaignère, J. Rullier

Proceedings Volume 8530, 853026 (2012) https://doi.org/10.1117/12.976839

KEYWORDS: Laser induced damage, Silica, Confocal microscopy, Carbon dioxide lasers, Polishing, UV optics, Microscopes, Laser damage threshold, Ultraviolet radiation, Solids

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Proceedings Article | 18 May 2009 Paper

Damage thresholds of various materials irradiated by 100-ps pulses of 21.2-nm laser radiation

V. Hájková, J. Chalupský, H. Wabnitz, J. Feldhaus, M. Störmer, Ch. Hecquet, T. Mocek, M. Kozlová, J. Polan, P. Homer, B. Rus, L. Juha

Proceedings Volume 7361, 736110 (2009) https://doi.org/10.1117/12.822950

KEYWORDS: Laser damage threshold, Polymethylmethacrylate, Silicon carbide, Mirrors, Free electron lasers, Digital image correlation, Atomic force microscopy, Zinc, Laser ablation, Coating

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Proceedings Article | 30 April 2009 Paper

Optical, chemical, and depth characterization of Al/SiC periodic multilayers

P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, A. Galtayries

Proceedings Volume 7360, 73600O (2009) https://doi.org/10.1117/12.820913

KEYWORDS: Silicon, Aluminum, Silicon carbide, Multilayers, Molybdenum, Ions, Interfaces, X-rays, Reflectivity, Chemical species

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Proceedings Article | 3 April 2008 Paper

EUV near normal incidence collector development at SAGEM

R. Mercier Ythier, X. Bozec, R. Geyl, A. Rinchet, Christophe Hecquet, Marie-Françoise Ravet-Krill, Franck Delmotte, Benoît Sassolas, Raffaele Flaminio, Jean-Marie Mackowski, Christophe Michel, Jean-Luc Montorio, Nazario Morgado, Laurent Pinard, Elodie Roméo

Proceedings Volume 6921, 692135 (2008) https://doi.org/10.1117/12.787620

KEYWORDS: Reflectivity, Mirrors, Coating, Extreme ultraviolet, Plasma, Manufacturing, Polishing, Annealing, Grazing incidence, Silicon carbide

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Proceedings Article | 3 October 2007 Paper

HECOR: a HElium CORonagraphy aboard the Herschel sounding rocket

Frédéric Auchère, Marie-Françoise Ravet-Krill, John Moses, Frédéric Rouesnel, Jean-Pierre Moalic, Denis Barbet, Christophe Hecquet, Arnaud Jérome, Raymond Mercier, Jean-Christophe Leclec'h, Franck Delmotte, Jeffrey Newmark

Proceedings Volume 6689, 66890A (2007) https://doi.org/10.1117/12.751447

KEYWORDS: Coronagraphy, Reflectivity, Mirrors, Multilayers, Coating, Extreme ultraviolet, Helium, Solar processes, Rockets, Stray light

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Proceedings Article | 18 May 2007 Paper

Design, conception, and metrology of EUV mirrors for aggressive environments

Christophe Hecquet, Marie-Françoise Ravet-Krill, Franck Delmotte, Arnaud Jérôme, Aurélie Hardouin, Françoise Bridou, Françoise Varnière, Marc Roulliay, Frédéric Bourcier, Jean-Michel Desmarres, Vincent Costes, Jacques Berthon, André Rinchet, Roland Geyl

Proceedings Volume 6586, 65860X (2007) https://doi.org/10.1117/12.723483

KEYWORDS: Reflectivity, Extreme ultraviolet, Multilayers, Extreme ultraviolet lithography, Humidity, Annealing, Reflectometry, Silicon carbide, Silicon, Space operations

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The development of new high power EUV sources and EUV space imaging requires optics having specific properties which depend on applications and operating conditions. These both applications are very different in the working multilayers environment. For the high power sources, multilayers are submitted to short pulses with high energy peak whereas, for the space imaging, multilayers are submitted to continuous flux with low level. Moreover photon energy and environment for both applications may be different. The environment may affect structure and top layer contamination when optics are stored, handled, mounted on the final device and finally operating. Main environmental parameters investigated are temperature and humidity variation. One objective is the optimisation of multilayer coatings to offer the highest resistance under photonic, ionic fluxes and temperature cycle. This means that interfacial diffusion between thin layers and degradation of the capping layers have to be avoided or reduced. The present study relies with designing, depositing and testing different structures of multilayer coatings in order to minimise the influence of the environment. Multilayer coatings based on molybdenum, silicon and silicon carbide materials have been deposited by magnetron sputtering on silicon and zerodur substrates. Samples were submitted to radiations emitted by an EUV source at wavelength closed to 13.5 nm. Furthermore they were also submitted to thermal cycles and annealing under warm humidity in the aim to simulate extremes storage or handling conditions as space mission's conditions. The damages and the performance of the multilayers were evaluated by using grazing incidence reflectometry at 0.154 nm and EUV reflectometry at the operating wavelength. After a presentation of the multilayer design, deposition and metrology tools, we will describe the different environmental effects on the coatings to take in care during EUV source exposure, handling and storage conditions. First results on multilayers performances to EUV source exposure and space specification tests are presented. Main damages studies were on annealing, thermal cycling and warm humidity.

Showing 5 of 11 publications

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