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Christopher P. Braun
Member Technical Staff at Broadcom Inc
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Publications (4)
Proceedings Article | 8 November 2005 Paper
Technical summary for the Foundry Data eXchange system
Christopher Braun, Gerry Krupka, Frederick Peiffer, Thomas Polk, Evelyn Roadcap, John Sosik, Gregory Van Allen, William Wilkinson
Proceedings Volume 5992, 59923O (2005) https://doi.org/10.1117/12.632243
KEYWORDS: Photomasks, Manufacturing, Integrated circuits, Databases, Semiconducting wafers, Photomask technology, Prototyping, Control systems, Data modeling, Integrated circuit design
Proceedings Article | 27 December 1996 Paper
On-product metrology results from MEBES 4-TFE System
Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262832
KEYWORDS: Metrology, Reticles, Lithography, Photomasks, Manufacturing, Standards development, Optical lithography, Time metrology, Image registration, Glasses
Proceedings Article | 8 December 1995 Paper
Investigation of GMC for CD uniformity benefits
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228161
KEYWORDS: Reticles, Photoresist processing, Inspection, Electron beams, Tolerancing, Manufacturing, Opacity, Polymers, Coating, Photomasks
Proceedings Article | 1 January 1992 Paper
Zero-bias PBS process for 5X reticles
Regine Tarascon-Auriol, Christophe Pierrat, Michael Stohl, Christopher Braun, James Burdorf, Sheila Vaidya
Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56944
KEYWORDS: Edge roughness, Reticles, Photomasks, Scanning electron microscopy, Opacity, Critical dimension metrology, Manufacturing, Tolerancing, Photoresist processing, Indium oxide
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