Christopher A. Lee
Product Line Manager at Corning Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 10 October 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Polishing, Optical lithography, Scanners, Computer simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Surface finishing

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photovoltaics, Polishing, Metrology, Optical lithography, Spatial frequencies, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 28 May 2018 Paper
Proc. SPIE. 10695, Optical Instrument Science, Technology, and Applications
KEYWORDS: Optical components, Reticles, Polishing, Optomechanical components, Metrology, Scanners, Error analysis, Manufacturing, Interferometry, Photomasks, Tolerancing, Precision lens assemblies

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Reticles, Scanners, Manufacturing, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Overlay metrology

Proceedings Article | 17 November 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Semiconductors, Lithography, Reticles, Metrology, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Showing 5 of 11 publications
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