Dr. Chris A. Spence
VP Advanced Technology Development at ASML Silicon Valley
SPIE Involvement:
Publications (46)

Proceedings Article | 13 October 2020 Poster + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Metrology, Data modeling, Calibration, Finite element methods, Photomasks, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Reticles, Logic, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Silica, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, System on a chip, Plasma treatment

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Lithography, Photomasks, Optical proximity correction, SRAF, Mask making, Process modeling

Proceedings Article | 28 April 2017 Presentation
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Signal to noise ratio, Metrology, Optical lithography, Data modeling, Calibration, Metals, Image analysis, Optical proximity correction, OLE for process control, Instrument modeling

Showing 5 of 46 publications
Conference Committee Involvement (3)
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
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