Dr. Chuck Wu Profile

Dr. Chuck Wu

President at Canyon Materials Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 9 November 2001 Paper

Fabrication of gray-scale masks and diffractive optical elements with LDW glass

Victor Korolkov, Anatoly Malyshev, Alexander Poleshchuk, Vadim Cherkashin, Hans Tiziani, Christof Pruss, Thomas Schoder, Johann Westhauser, Chuck Wu

Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448026

KEYWORDS: Transmittance, Global system for mobile communications, Glasses, Photoresist materials, Diffractive optical elements, Photomasks, Printing, Etching, Modulation, Spatial resolution

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Proceedings Article | 1 June 1999 Paper

Adapting existing e-beam writers to write HEBS-glass gray-scale masks

Ernst-Bernhard Kley, Matthias Cumme, Lars-Christian Wittig, Chuck Wu

Proceedings Volume 3633, (1999) https://doi.org/10.1117/12.349333

KEYWORDS: Beam shaping, Photomasks, Thermal effects, Glasses, Gaussian beams, Silver, Electron beams, Lithography, Calibration, Ions

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Proceedings Article | 1 June 1999 Paper

Application of gray-scale LDW-glass masks for fabrication of high-efficiency DOEs

Victor Korolkov, Anatoly Malyshev, Vladislav Nikitin, Alexander Poleshchuk, Andrey Kharissov, Vadim Cherkashin, Chuck Wu

Proceedings Volume 3633, (1999) https://doi.org/10.1117/12.349316

KEYWORDS: Transmittance, Glasses, Photoresist materials, Quartz, Manufacturing, Global system for mobile communications, Silver, Fresnel lenses, Laser systems engineering, Modulation transfer functions

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Proceedings Article | 7 May 1996 Paper

One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask

Walter Daschner, Robert Stein, Pin Long, Chuck Wu, Sing Lee

Proceedings Volume 2689, (1996) https://doi.org/10.1117/12.239618

KEYWORDS: Photomasks, Diffractive optical elements, Lithography, Micro optics, Computer generated holography, Ion beams, Etching, Photoresist processing, Mask making, Analog electronics

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Conference Committee Involvement (1)

Lithographic and Micromachining Techniques for Optical Component Fabrication II

3 August 2003 | San Diego, California, United States

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