Mr. Chun-juan Zhang Profile

Chun-juan Zhang

SPIE Involvement:

Author

Publications (2)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 15 February 2022 Paper

Research on the properties of Ta2O5 optical films prepared with APS plasma assisted deposition

Yong-gang Pan, Zheng Liu, Wen-cheng Liu, Mian Li, Si-bao Zhang, Chang-xin Luo, Chun-juan Zhang

Proceedings Volume 12166, 1216602 (2022) https://doi.org/10.1117/12.2604831

KEYWORDS: Coating, Refractive index, Thin films, Plasma, Surface roughness

Read Abstract +

Ta₂O₅ thin films are widely used in optical and microelectronic industry because of its superior optical and mechanical properties. In this paper, single-layer Ta₂O₅ thin films were prepared by APS plasma assisted electron beam evaporation deposition. Based on the theory of ion energy transfer, the selection criteria of APS process parameters were established. By optimizing APS source parameters, Ta₂O₅ thin films with different characteristics were prepared. The spectral and refractive index dispersion of Ta₂O₅ thin films were analyzed by Cary7000 spectrophotometer. The stress and surface roughness of Ta₂O₅ films were analyzed by Zygo interferometer. Experiment and analysis results showed that the characteristics of Ta₂O₅ thin films are closely related to APS plasma assisted processing parameters. The discharge current and bias voltage of APS source have great influence on the stress and surface roughness of Ta₂O₅ thin films, but have little influence on the spectral characteristics and refractive index dispersion. The influences of preparation parameters on the properties of Ta₂O₅ thin films were analyzed and optimization fabrication parameters were obtained.

Proceedings Article | 9 August 2021 Paper

Research on the properties of HfO2 optical films prepared with APS assisted electron beam evaporation deposition

Yong-gang Pan, Zheng Liu, Mian Li, Wen-cheng Liu, Long Bai, Si-bao Zhang, Chang-xin Luo, Chun-juan Zhang

Proceedings Volume 11912, 1191207 (2021) https://doi.org/10.1117/12.2602069

Read Abstract +

HfO₂ thin films are widely used in laser system because of its superior optical and mechanical properties, especially high laser induced damage threshold. In this paper, single-layer HfO₂ thin films were prepared by APS plasma assisted electron beam evaporation deposition. The effects of oxygen charging of electron gun, baking temperature, discharge current of APS source and bias voltage of APS source on optical properties, surface roughness, standing wave electric filed and laser induced damage threshold of HfO₂ thin films were studied by orthogonal experiment. Experiment and analysis results showed that the characteristics of HfO₂ thin films are closely related to the oxygen charging of electron gun, baking temperature and APS assisted processing parameters. Especially, baking temperature, oxygen charging of electron gun and bias voltage of APS source have great influence on laser induced damage threshold. Through the analysis of experimental date, the optimal combination of process parameters for APS assisted electron beam evaporation of HfO₂ optical films were obtained.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years