Chung-Te Hsuan
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 March 2021 Presentation + Paper
Proc. SPIE. 11614, Design-Process-Technology Co-optimization XV
KEYWORDS: Lithography, Etching, Photomasks, Process modeling, Lead

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11613, Optical Microlithography XXXIV
KEYWORDS: Lithography, Manufacturing, 3D modeling, Printing, Photomasks, Source mask optimization, SRAF, Molybdenum, Model-based design, Resolution enhancement technologies

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Calibration, Error analysis, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Data modeling, Calibration, Metals, Inspection, Finite element methods, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Lithography, Lithographic illumination, Data modeling, Calibration, Projection systems, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers

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