Dr. Claude Montcalm Profile

Dr. Claude Montcalm

Sr. Research Scientist at Iridian Spectral Technologies Ltd

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 12 July 2019 Open Access

Solar rejection window and narrow band pass filters for the Meteosat third generation lighting imager

C. Montcalm, A. Badeen, D. Burbidge, R. Bruce, G. Carlow, J. Dane, N. Firdawsi, G. E. Laframboise, A. Miles, J.-P. Noel, R. Rinfret, B. Sullivan, R. Bardazzi, S. Lorenzini, L. Giunti

Proceedings Volume 11180, 111804Z (2019) https://doi.org/10.1117/12.2536098

KEYWORDS: Optical filters, Transmittance, Coating, Lithium, Reflectivity, Imaging systems, Ultraviolet radiation, Annealing, Polarization, Head

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Proceedings Article | 25 September 2008 Paper

Advanced optical coatings for telecom and spectroscopic applications

Adam Badeen, Michelle Briere, Peter Hook, Claude Montcalm, Robert Rinfret, Joshua Schneider, Brian Sullivan

Proceedings Volume 7101, 71010H (2008) https://doi.org/10.1117/12.797949

KEYWORDS: Optical filters, Transmittance, Raman spectroscopy, Thin films, Fabry–Perot interferometers, Optics manufacturing, Luminescence, Silicon, Manufacturing, Electronic filtering

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Proceedings Article | 20 August 2001 Paper

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Eberhard Spiller, Mark Schmidt, Courtney Davidson, R. Fred Grabner, Eric Gullikson, Benjamin Kaufmann, Stanley Mrowka, Sherry Baker, Henry Chapman, Russell Hudyma, John Taylor, Christopher Walton, Claude Montcalm, James Folta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436695

KEYWORDS: Multilayers, Mirrors, Reflectivity, Optical coatings, Extreme ultraviolet lithography, Scattering, Extreme ultraviolet, Light scattering, Imaging systems, Cameras

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Proceedings Article | 20 August 2001 Paper

System integration and performance of the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, William Replogle, Richard Stulen, Glenn Kubiak, Paul Rockett, Leonard Klebanoff, Karen Jefferson, Alvin Leung, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Regina Soufli, Eberhard Spiller, Kenneth Blaedel, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, Phillip Batson, David Attwood, Keith Jackson, Scott Hector, Charles Gwyn, Pei-yang Yan

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436665

KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Reticles, Projection systems, Sensors, Xenon, Mirrors, Optical alignment, Fiber optic illuminators, Multilayers

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SPIE Journal Paper | 1 March 2001

Reduction of residual stress in extreme ultraviolet Mo/Si multilayer mirrors with post deposition thermal treatments

Claude Montcalm

OE, Vol. 40, Issue 03, (March 2001) https://doi.org/10.1117/12.10.1117/1.1346584

KEYWORDS: Reflectivity, Multilayers, Annealing, Extreme ultraviolet, Semiconducting wafers, Mirrors, Silicon, Extreme ultraviolet lithography, EUV optics, Optical engineering

Proceedings Article | 22 January 2001 Paper

Predictive model of the cost of extreme-ultraviolet lithography masks

Scott Hector, Patrick Kearney, Claude Montcalm, James Folta, Christopher Walton, William Tong, John Taylor, Pei-yang Yan, Charles Gwyn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410754

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Inspection, Coating, Optical lithography, Lithography, Process modeling, Defect detection, Ion beams

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Proceedings Article | 21 July 2000 Paper

EUV engineering test stand

Daniel Tichenor, Glenn Kubiak, William Replogle, Leonard Klebanoff, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Russell Hudyma, Kenneth Goldberg, Patrick Naulleau

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390083

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Mirrors, Semiconducting wafers, Distortion, Optical alignment, Fiber optic illuminators, Tolerancing, Optical design

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Proceedings Article | 21 July 2000 Paper

High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography

Marco Wedowski, James Underwood, Eric Gullikson, Sasa Bajt, James Folta, Patrick Kearney, Claude Montcalm, Eberhard Spiller

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390107

KEYWORDS: Multilayers, Reflectivity, Optical coatings, Reflectometry, Mirrors, Extreme ultraviolet lithography, Calibration, Sensors, Projection systems, Extreme ultraviolet

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Proceedings Article | 23 November 1999 Paper

Multilayer coated optics for an alpha-class extreme ultraviolet lithography system

Claude Montcalm, R. Fred Grabner, Russell Hudyma, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, James Folta

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371119

KEYWORDS: Reflectivity, Multilayers, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Projection systems, Lithography, Optical components, Mirrors, EUV optics

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Proceedings Article | 23 November 1999 Paper

Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography

Sasa Bajt, Ricke Behymer, Paul Mirkarimi, Claude Montcalm, Mark Wall, Marco Wedowski, James Folta

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371125

KEYWORDS: Multilayers, Reflectivity, Beryllium, Extreme ultraviolet lithography, Mirrors, Molybdenum, Extreme ultraviolet, Transmission electron microscopy, Crystals, Interfaces

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Proceedings Article | 25 June 1999 Paper

Multilayer coating of 10X projection optics for extreme ultraviolet lithography

Claude Montcalm, Eberhard Spiller, Marco Wedowski, Eric Gullikson, James Folta

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351157

KEYWORDS: Reflectivity, Mirrors, Multilayers, Optical coatings, Projection systems, Extreme ultraviolet, Cameras, Extreme ultraviolet lithography, Tolerancing, Adaptive optics

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Proceedings Article | 25 June 1999 Paper

Advances in multilayer reflective coatings for extreme ultraviolet lithography

James Folta, Sasa Bajt, Troy Barbee, R. Fred Grabner, Paul Mirkarimi, Tai Nguyen, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, Claude Montcalm

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351156

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Optical coatings, Extreme ultraviolet, Mirrors, EUV optics, Lithography, Projection systems, Silicon

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Proceedings Article | 25 June 1999 Paper

Sub-100-nm lithographic imaging with an EUV 10X microstepper

John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097

KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

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Proceedings Article | 25 June 1999 Paper

EUV scattering and flare of 10X projection cameras

Eric Gullikson, Sherry Baker, John Bjorkholm, Jeffrey Bokor, Kenneth Goldberg, John Goldsmith, Claude Montcalm, Patrick Naulleau, Eberhard Spiller, Daniel Stearns, John Taylor, James Underwood

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351162

KEYWORDS: Scattering, Cameras, Mirrors, Extreme ultraviolet, Spatial frequencies, Point spread functions, Light scattering, Multilayers, Laser scattering, Coating

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Proceedings Article | 5 June 1998 Paper

Multilayer reflective coatings for extreme-ultraviolet lithography

Claude Montcalm, Sasa Bajt, Paul Mirkarimi, Eberhard Spiller, Frank Weber, James Folta

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309600

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Optical coatings, EUV optics, Silicon, Interfaces, Molybdenum

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Proceedings Article | 5 June 1998 Paper

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography

Paul Mirkarimi, Claude Montcalm

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309565

KEYWORDS: Reflectivity, Multilayers, Annealing, Extreme ultraviolet, Silicon, Amorphous silicon, Molybdenum, Extreme ultraviolet lithography, Silicon films, Semiconducting wafers

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