CONFERENCE PROCEEDINGS
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Clovis Alleaume
Engineer at ASML Netherlands BV
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Publications (4)
Proceedings Article | 12 April 2013 Paper
Best focus shift mitigation for extending the depth of focus
A. Szucs, J. Planchot, V. Farys, E. Yesilada, C. Alleaume, L. Depre, R. Dover, C. Gourgon, M. Besacier, A. Nachtwein, P. Rusu
Proceedings Volume 8683, 868313 (2013) https://doi.org/10.1117/12.2011114
KEYWORDS: Wavefronts, Photomasks, Calibration, Scanning electron microscopy, Semiconducting wafers, Scanners, Lithography, Metals, Optical proximity correction, Source mask optimization
Proceedings Article | 5 April 2011 Paper
Quantification of the difference between two sources by Zernike polynomial decomposition
Proceedings Volume 7973, 79731Y (2011) https://doi.org/10.1117/12.881779
KEYWORDS: Zernike polynomials, Source mask optimization, Scanners, Image processing, Optical lithography, Photomasks, Distance measurement, Resolution enhancement technologies, Semiconducting wafers, Monochromatic aberrations
Proceedings Article | 23 March 2011 Paper
Enabling 22-nm logic node with advanced RET solutions
Proceedings Volume 7973, 79730T (2011) https://doi.org/10.1117/12.870753
KEYWORDS: Lithography, Etching, Double patterning technology, Optical lithography, Critical dimension metrology, Resolution enhancement technologies, Photomasks, SRAF, Image processing, Logic
Proceedings Article | 1 October 2010 Paper
A systematic study of source error in source mask optimization
Proceedings Volume 7823, 782312 (2010) https://doi.org/10.1117/12.864246
KEYWORDS: Source mask optimization, Photovoltaics, Critical dimension metrology, Lithography, Photomasks, Optical proximity correction, Optical lithography, Resolution enhancement technologies, Metals, Visualization
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