CONFERENCE PROCEEDINGS
Advanced Search
Cole Franklin
Principal Scientist at Apple
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 5 November 2005 Paper
Advanced mask cleaning techniques for sub-100-nm technology nodes
James Papanu, Roman Gouk, Cole Franklin, Han-Wen Chen, Steven Verhaverbeke, Alexander Ko, Kent Child, Pieter Boelen, Suresh Shrauti, Elias Martinez, Brian Brown
Proceedings Volume 5992, 59921G (2005) https://doi.org/10.1117/12.632294
KEYWORDS: Particles, Photomasks, Chemistry, Chromium, Photoresist materials, Mask cleaning, Photoresist processing, Plasma, Phase shifts, Transmittance
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top