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Dr. Conor S. Rafferty
Chief Technical Officer at NoblePeak Vision Corp
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Author
Publications (3)
Proceedings Article | 4 May 2010 Paper
Wide-band imaging for enhanced day and night vision
Conor Rafferty, Clifford King, Bryan Ackland, Jason Sproul, Ingvar Aberg, Jay O'Neill, T. Sriram, Corbin Godek, Analisa Lattes, Seth Pappas, Arnie Buck, Vasilije Jovanovic
Proceedings Volume 7660, 76600M (2010) https://doi.org/10.1117/12.850514
KEYWORDS: Cameras, Imaging systems, Sensors, Electron multiplying charge coupled devices, Germanium, Video, Photons, Interference (communication), Short wave infrared radiation, Transistors
Proceedings Article | 15 April 2008 Paper
Monolithic germanium SWIR imaging array
Conor Rafferty, Clifford King, Bryan Ackland, Ingvar Aberg, T. Sriram, Jay O'Neill
Proceedings Volume 6940, 69400N (2008) https://doi.org/10.1117/12.782133
KEYWORDS: Germanium, Silicon, Imaging systems, Short wave infrared radiation, Transistors, Cameras, Imaging arrays, Visible radiation, Photodiodes, Microlens
Proceedings Article | 11 June 1999 Paper
Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography
Raymond Cirelli, J. Bude, William Mansfield, G. Timp, Fred Klemens, Pat Watson, Gary Weber, James Sweeney, Francis Houlihan, Allen Gabor, Fred Baumann, M. Buonanno, G. Forsyth, D. Barr, T. Lee, C. Rafferty, Richard Hutton, Allen Timko, J. Hergenrother, Elsa Reichmanis, Lloyd Harriott, S. Hillenius, Omkaram Nalamasu
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350213
KEYWORDS: Etching, Photomasks, Lithography, Diffusion, Semiconducting wafers, Phase shifts, 193nm lithography, Photoresist materials, Silicon, Chemically amplified resists
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