Mr. Corey Lemley Profile

Corey Lemley

Process Engineer at TEL Technology Ctr America LLC

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Publications (7)

Proceedings Article | 26 March 2019 Paper

The defect mitigation on EUV stack by track based technology

Naoki Shibata, Lior Huli, Corey Lemley, Yuichiro Miyata, Dave Hetzer, Toshiharu Wada, Akiteru Ko, Shinichiro Kawakami, Akiko Kai, Takahiro Shiozawa, Hidetsugu Yano, Kenichi Ueda, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard

Proceedings Volume 10957, 109571J (2019) https://doi.org/10.1117/12.2514885

KEYWORDS: Extreme ultraviolet, Optical lithography, Bridges, Extreme ultraviolet lithography, Inspection, Photoresist processing, Coating, Particles, Semiconducting wafers

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Proceedings Article | 19 October 2018 Paper

Track based techniques to improve high-resolution EUV patterning defectivity

Naoki Shibata, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard, Rick Johnson

Proceedings Volume 10809, 1080922 (2018) https://doi.org/10.1117/12.2501668

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Coating, Manufacturing

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SPIE Journal Paper | 5 September 2018

Defect detection strategies and process partitioning for single-expose EUV patterning

Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox

JM3, Vol. 18, Issue 01, 011006, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011006

KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

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Proceedings Article | 28 March 2018 Presentation + Paper

Defect detection strategies and process partitioning for SE EUV patterning

Proceedings Volume 10583, 105830E (2018) https://doi.org/10.1117/12.2297362

KEYWORDS: Inspection, Semiconducting wafers, Etching, Stochastic processes, Extreme ultraviolet, Modulation, Defect detection, Extreme ultraviolet lithography, Coating, Electron beam lithography

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Proceedings Article | 16 October 2017 Paper

Coater/developer based techniques to improve high-resolution EUV patterning defectivity

Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Akiteru Ko, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Koichiro Tanaka, Karen Petrillo, Luciana Meli, Anuja De Silva, Yongan Xu, Nelson Felix, Richard Johnson, Cody Murray, Alex Hubbard

Proceedings Volume 10450, 104501U (2017) https://doi.org/10.1117/12.2280506

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line width roughness, Coating, Manufacturing, Contamination

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Proceedings Article | 28 March 2017 Paper

Driving down defect density in composite EUV patterning film stacks

Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Richard Johnson, Cody Murray, Alex Hubbard, Danielle Durrant, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga

Proceedings Volume 10143, 101430Y (2017) https://doi.org/10.1117/12.2260146

KEYWORDS: Extreme ultraviolet, Optical lithography, Coating, Composites, Manufacturing, Inspection, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet lithography, Defect detection, Laser scattering, Air contamination

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Proceedings Article | 18 March 2016 Paper

EUV patterning successes and frontiers

Nelson Felix, Dan Corliss, Karen Petrillo, Nicole Saulnier, Yongan Xu, Luciana Meli, Hao Tang, Anuja De Silva, Bassem Hamieh, Martin Burkhardt, Yann Mignot, Richard Johnson, Chris Robinson, Mary Breton, Indira Seshadri, Derren Dunn, Stuart Sieg, Eric Miller, Genevieve Beique, Andre Labonte, Lei Sun, Geng Han, Erik Verduijn, Eunshoo Han, Bong Cheol Kim, Jongsu Kim, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga

Proceedings Volume 9776, 97761O (2016) https://doi.org/10.1117/12.2219894

KEYWORDS: Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Oxides, Neodymium, Ions, Etching

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Showing 5 of 7 publications

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