Directed self-assembly (DSA) of block copolymers has attracted much interest for its use as a low-cost, high throughput patterning tool to supplement existing lithographic techniques, and especially for its ability to easily pattern vertical interconnect accesses (VIAs).1 Assembling multiple cylinders in a single template has obvious advantages for feature density increase. However, denser patterning comes at a cost, due to more abundant defect modes2 and increased susceptibility to placement errors due to thermal fluctuations. Linear arrays of cylinders have been shown in a simplified model to contain collective excitations, ultimately leading to unbounded positional variance away from their equilibrium locations in a manner analogous to a one-dimensional crystal.3 In order to reduce this positional uncertainty, we introduce chemically selective stripes on the substrate of the system. These chemoepitaxially patterned regions create an energetic preference for the equilibrium configuration of the system, pinning the VIAs in place. In this study, we use three-dimensional self-consistent field theory (SCFT) simulations and complex Langevin (CL) sampling to investigate the effects of thermal fluctuations on cylinder positions in linear arrays of VIAs with preferentially striped substrates. We interrogate the relationship between stripe interaction strength and positional variance, compare the magnitude of reduction with a Landau-Peierls analysis on a simplified system, and propose a predictive model for placement error in similarly chemo patterned systems. Since the cylinders are flexible, we propose a maximum system height for linear arrays with acceptably low placement error.
Directed self-assembly (DSA) of block copolymers has gained much attention for its potential as a low-cost, high-throughput patterning tool to supplement existing lithographic techniques, and in particular for its ability to easily pattern vertical interconnect accesses (VIAs).1 Single-hole shrink has been extensively explored, but the continued push towards higher-resolution patterns requires more efficient, less space-consuming approaches. The lithographic resolution limits the minimum distance between two features, and the single-hole templates take up valuable real estate on the wafer.2 To accommodate denser features and relax the resolution requirements of the lithographic techniques, it is prudent to move to multi-VIA configurations in which two or more features are assembled in a single guiding template (such as a peanut,3 or a rounded rectangle4). This allows considerably denser feature patterning, but comes at the cost of more plentiful and complicated defect modes than those found in single-hole shrink features. Most systems contain persistent horizontal structures (eg. rings, U-defects, or bars as shown in Figure 1) that prove detrimental to the etch process and yield undesirable configurations. Largely unexplored is the tandem use of chemoepitaxy and graphoepitaxy to suppress defect modes in multi- VIA templates. Specifically, chemically selective patterning of the substrate beneath a template could act synergistically with the template's lateral guidance to lower defectivity.
In this study, we use three-dimensional self-consistent field theory (SCFT) simulations to investigate the equilibrium and metastable defective configurations of di-block copolymer DSA systems in the presence of chemically selective or neutral template sidewalls and preferentially attractive striped substrates. We identify chemo-patterning schemes that maximize defect energies, including sidewall interaction strength and chemical preference. In addition, we discuss chemo-patterning schemes that backfire, creating even more complicated and persistent defect modes such as horizontal half-cylinders on the system substrate.
Directed self-assembly (DSA) of block copolymers has attracted attention for its use as a simple, cost- effective patterning tool for creating vertical interconnect access (VIA) channels in nanoelectronic devices.1, 2 This technique supplements existing lithographic technologies to allow for the creation of high-resolution cylindrical holes whose diameter and placement can be precisely controlled. In this study, we use self-consistent field theory (SCFT) simulations to investigate the equilibrium configurations of under-filled DSA systems with air-polymer interactions. We report on a series of SCFT simulations of our three species (PMMA-b-PS diblock and air) model in cylindrical confinement to explore the role of template diameter, under-fill fraction (i.e. volume fraction of air), air-polymer surface interaction and polymer-side wall/substrate interactions on equilibrium morphologies in an under-filled template with a free top surface. We identify parameters and system configurations where a meniscus appears and explore cases with PMMA-attractive, PS-attractive, and all-neutral walls to understand the effects of wall properties on meniscus geometry and DSA morphology. An important outcome is an understanding of the parameters that control the contact angle of the meniscus with the wall, as it is one of the simplest quantitative measures of the meniscus shape. Ultimately, we seek to identify DSA formulations, templates, and surface treatments with predictable central cylinder diameter and a shallow contact angle, as these factors would facilitate broad process windows and ease of manufacturing.
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