Craig L. Ghelli
Outside Services Engineer
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Diffractive optical elements, Particles, Coating, Control systems, Photoresist materials, Semiconducting wafers, Wafer testing, Photoresist developing, Liquids

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Scanning electron microscopy, Photoresist materials, Plasma etching, Semiconducting wafers, Photoresist developing, Plasma

Proceedings Article | 25 June 1999 Paper
Proc. SPIE. 3676, Emerging Lithographic Technologies III
KEYWORDS: Lithography, Antireflective coatings, Metals, Silicon, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Mask making, Semiconducting wafers, Charged-particle lithography

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