Cyrus E. Tabery
Member of Technical Staff at ASML US Inc
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Inspection, Extreme ultraviolet, Metrology, Etching, Chemical mechanical planarization, Polishing, Logic, Optical alignment, Overlay metrology, Copper

Proceedings Article | 26 March 2019 Presentation
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Overlay metrology, Metrology, Logic, Copper, Inspection, Process modeling, Scanning electron microscopy, Wafer inspection, Error analysis, Photomasks

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Pattern recognition, Fingerprint recognition, Semiconducting wafers, Scanners, Metrology, Overlay metrology, Optical lithography, Lithography, Manufacturing, Optical parametric oscillators, Process control, Principal component analysis

Proceedings Article | 30 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Optical proximity correction, Manufacturing, Process modeling, Design for manufacturing, Extreme ultraviolet, Data processing, Databases, Optical calibration, Model-based design, Optical lithography, Sensors, Standards development, Deep ultraviolet

Showing 5 of 37 publications
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