Collinear holography data storage (CHDS) is a promising solution for “cold data” storage in the big data age. Studies adopt “amplitude type” and “phase type” orthogonal reference have been sequentially reported for the performance improvement of CHDS. Data from different users can be storage and readout separately by different orthogonal reference, which is meaningful for the application of security data storage. In this paper, a newly “phase type” orthogonal reference specified by a Hadamard orthogonal matrix is proposed for identity information storage. Each one Hadamard vector on behalf of a “phase type” reference, and the symbols “1” and “-1” in Hadamard matrix stands for the phase of 0 and pi of the reference pixel. Several different data pages are recorded using different orthogonal reference in advance, and there is only the specific data page which is matched to the orthogonal reference can be reproduced in the process of reconstruction. The action mechanism of orthogonal reference is analyzed, and the feasibility of the system is verified by numerical simulations and primary experiments.
Soft x-ray varied line spacing grating (VLSG), which is a vital optical element for laser plasma diagnosis and spectrometry analysis, is conventionally fabricated by holographic lithography or mechanical ruling. In order to overcome the issues of the above fabrication methods, a method based on electron beam lithography-near field lithography (EBL-NFH) is proposed to make good use of the flexibility of EBL and the high throughput of NFH. In this paper, we showed a newly designed soft x-ray VLSG with a central groove density of 3600 lines/mm, which is to be realized based on EBL-NFH. First, the optimization of the spatial distribution of line density and groove profile of the VLSG was shown. As an important element in NFH, a fused silica mask plays a key role during NFH in order to obtain a required line density of VLSG. Therefore, second, the transfer relationship of spatial distribution of line densities between fused silica mask and resist grating was investigated in different exposure modes during NFH. We proposed a formulation about the transfer of line density to design of the groove density distribution of a fused silica grating mask. Finally, the spatial distribution of line densities between the fused silica mask, which is to be fabrication by using EBL, was demonstrated.