Mr. Daeyoup Lee Profile

Daeyoup Lee

at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 27 March 2017 Paper

Study for new hardmask process scheme

Daeyoup Lee, Phillip Tatti, Richard Lee, Jack Chang, Winston Cho, Sanggil Bae

Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV

KEYWORDS: Carbon, Near infrared, Lithography, Optical lithography, Etching, Resistance, Optical alignment, Semiconducting wafers, System on a chip, Overlay metrology

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Proceedings Article | 12 May 2005 Paper

Illumination and multi-step OPC optimization to enhance process margin of the 65nm node device exposed by dipole illumination

Soo-Han Choi, Tae-Hoon Park, Eunsung Kim, Hyoung-Joo Youn, Dae-Youp Lee, Yong-Chan Ban, A-Young Je, Dong-Hyun Kim, Ji-Suk Hong, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Thin films, Lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Model-based design

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Proceedings Article | 22 August 2001 Paper

Method for prevention of unopened contact hole in dual-damascene process

Gyu-Ho Lyu, Chang-Hwan Kim, Suk-Joo Lee, Hee-Hong Yang, Dae-Yup Lee, Ji-Yong Yoo, Jeong-Woo Lee, Yoo-Hyon Kim, Jeong-Lim Nam, Woo-Sung Han

Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV

KEYWORDS: Optical lithography, Deep ultraviolet, Reflection, Etching, Copper, Resistance, Photoresist materials, Critical dimension metrology, Photoresist processing, Absorption

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Proceedings Article | 22 August 2001 Paper

Control of resist flow process for sub-0.15-um small contact hole by latent image

Byung-Kap Kim, Suk-Joo Lee, Dae-Yup Lee, Jeong-Woo Lee, Jeong-Lim Nam

Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV

KEYWORDS: Microfluidics, Glasses, Image processing, Chromium, Control systems, Photomasks, Radiofrequency ablation, Critical dimension metrology, Photoresist processing, Phase shifts

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Proceedings Article | 24 July 1996 Paper

Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination

Hyoungjoon Kim, Jongwook Kye, Dae-Yup Lee, Sang-Gyun Woo, Hoyoung Kang, Young-Bum Koh

Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III

KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Lithographic illumination, Deep ultraviolet, Printing, Photomasks, Halftones, Semiconducting wafers, Phase shifts

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