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Dai Oguro
at Mitsubishi Gas Chemical Co Inc
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Author
Publications (1)
Proceedings Article | 1 April 2009 Paper
Development of new phenylcalix[4]resorcinarene: its application to positive-tone molecular resist for EB and EUV lithography
Proceedings Volume 7273, 72732Q (2009) https://doi.org/10.1117/12.813487
KEYWORDS: Extreme ultraviolet lithography, Line edge roughness, Standards development, Optical lithography, Semiconducting wafers, Silicon, Industrial chemicals, Polymers, Cadmium sulfide, Etching
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