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Daigo Hoshino
at Oki Electric Industry Co Ltd
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Publications (1)
Proceedings Article | 26 June 2003 Paper
Detection of actual focus variations by focus automatic measurement
Daigo Hoshino, Takashi Yamauchi, Akira Watanabe, Toshio Onodera, Hidehiro Higashino
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485353
KEYWORDS: Semiconducting wafers, Calibration, Photomasks, Scanners, Silicon, Optical inspection, Overlay metrology, Inspection, Binary data, Wafer-level optics
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