Mr. Daisuke Hara Profile

Daisuke Hara

Director of Engineering at D2S KK

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Publications (8)

Proceedings Article | 13 July 2017 Paper

Model-based MPC enables curvilinear ILT using either VSB or multi-beam mask writers

Linyong Pang, Yutetsu Takatsukasa, Daisuke Hara, Michael Pomerantsev, Bo Su, Aki Fujimura

Proceedings Volume 10454, 1045407 (2017) https://doi.org/10.1117/12.2281110

KEYWORDS: Photomasks, Model-based design, Lithography, Computational lithography, Mask making, Process modeling, Optical proximity correction, Etching, Modulation, Convolution, Image processing

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Proceedings Article | 23 October 2015 Paper

The capability of lithography simulation based on MVM-SEM system

Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang

Proceedings Volume 9635, 96351X (2015) https://doi.org/10.1117/12.2197818

KEYWORDS: Lithography, Photomasks, Scanning electron microscopy, Semiconducting wafers, 3D acquisition, 3D metrology, Defect inspection, Defect detection, Manufacturing, Standards development, Critical dimension metrology, Extreme ultraviolet, Bridges, Image analysis, 193nm lithography

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Proceedings Article | 9 July 2015 Paper

Study of defect verification based on lithography simulation with a SEM system

Proceedings Volume 9658, 96580V (2015) https://doi.org/10.1117/12.2197617

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Defect inspection, Optical lithography, Signal to noise ratio, Source mask optimization

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Proceedings Article | 28 June 2013 Paper

Better numerical model for shape-dependent dose margin correction using model-based mask data preparation

Yasuki Kimura, Takao Kubota, Kenji Kouno, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara

Proceedings Volume 8701, 87010H (2013) https://doi.org/10.1117/12.2028333

KEYWORDS: Photomasks, Data modeling, Model-based design, Process modeling, Critical dimension metrology, Mask making, Computer simulations, Logic, Lithography, Electron beams

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Proceedings Article | 28 June 2013 Paper

Photomask quality evaluation using lithography simulation and multi-detector MVM-SEM

Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8701, 87010A (2013) https://doi.org/10.1117/12.2027201

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, 3D image processing, 3D metrology, Defect inspection, Optical inspection, Databases, Inspection

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Proceedings Article | 8 November 2012 Paper

Photomask quality evaluation using lithography simulation and precision SEM image contour data

Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, Anthony Adamov

Proceedings Volume 8522, 852226 (2012) https://doi.org/10.1117/12.964994

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Image quality, Sensors, Signal detection, Databases, 3D metrology, Inspection

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Proceedings Article | 8 November 2012 Paper

Shape-dependent dose margin correction using model-based mask data preparation

Yasuki Kimura, Ryuuji Yamamoto, Takao Kubota, Kenji Kouno, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8522, 85221I (2012) https://doi.org/10.1117/12.958601

KEYWORDS: Photomasks, Data modeling, Model-based design, Mask making, Logic, Immersion lithography, Electron beams, Vestigial sideband modulation, SRAF, Modulation

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Proceedings Article | 25 September 2010 Paper

Improvement of mask write time for curvilinear assist features at 22nm

Aki Fujimura, Ingo Bork, Taiichi Kiuchi, Tadashi Komagata, Yasutoshi Nakagawa, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 7823, 782307 (2010) https://doi.org/10.1117/12.864094

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Scanning electron microscopy, Vestigial sideband modulation, Printing, Data modeling, Manufacturing, Error analysis, System on a chip

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Showing 5 of 8 publications

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