Dr. Daniel J. Dechene
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Conference Program Committee | Author
Publications (9)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 25 March 2020 Presentation
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Defect detection, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 26 September 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Defect detection, Sensors, Error analysis, Inspection, Attenuators, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Scanners, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Process modeling

Showing 5 of 9 publications
Conference Committee Involvement (1)
Design-Technology Co-optimization XV
22 February 2021 | Online Only, California, United States
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