Dan Schurz
Product Integration Manager at Veeco Instruments Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Microelectromechanical systems, Lithography, Metrology, Cameras, Calibration, Manufacturing, Image registration, Precision measurement, Optical alignment, Semiconducting wafers

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Metrology, Imaging systems, Cameras, Calibration, Image registration, Micromachining, Optical alignment, Semiconducting wafers, Tolerancing

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Packaging, Semiconductors, Lithography, Reticles, Particles, Pellicles, Photoresist materials, Semiconducting wafers, Saturn, Electroplating

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Packaging, Lithography, Reticles, Lithographic illumination, Glasses, Mercury, Pellicles, Photoresist materials, Excimer lasers, Semiconducting wafers

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Phase shifting, Optical lithography, Manufacturing, Photoresist materials, Photomasks, Optical proximity correction, Binary data, Resolution enhancement technologies

Showing 5 of 13 publications
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