Dan N. Zhang
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Image processing, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

Proceedings Article | 14 March 2006 Paper
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Statistical analysis, Image processing, Error analysis, Manufacturing, Nanoimprint lithography, Semiconducting wafers, Statistical modeling, Model-based design, Process modeling

Proceedings Article | 8 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Data modeling, Error analysis, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Error analysis, Control systems, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Model-based design

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Data modeling, Metals, Error analysis, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Overlay metrology, Resolution enhancement technologies

Showing 5 of 6 publications
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