Dr. Daniel J. Bald Profile

Dr. Daniel J. Bald

Engineering Manager at Intel Corp

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Author

Publications (9)

Proceedings Article | 5 April 2007 Paper

Real time monitoring of reticle etch process tool to investigate and predict critical dimension performance

Rick Deming, Karmen Yung, Mark Guglielmana, Dan Bald, Kiho Baik, Frank Abboud

Proceedings Volume 6518, 65181V (2007) https://doi.org/10.1117/12.712323

KEYWORDS: Data modeling, Performance modeling, Process modeling, Reticles, Etching, Sensors, Metrology, Critical dimension metrology, Manufacturing, Data processing

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Proceedings Article | 5 November 2005 Paper

Impact of DUV exposure on reticle repairs

Vikram Tolani, Scott Chegwidden, Edgar Buenconsejo, Daniel Tanzil, Daniel Bald

Proceedings Volume 5992, 59921A (2005) https://doi.org/10.1117/12.631637

KEYWORDS: Reticles, Photomasks, Deep ultraviolet, Semiconducting wafers, Atomic force microscopy, Ion beams, Phase shifts, Floods, Printing, Scanners

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Proceedings Article | 6 December 2004 Paper

E-beam mask repair: fundamental capability and applications

Ted Liang, Eric Frendberg, Daniel Bald, Michael Penn, Alan Stivers

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569210

KEYWORDS: Etching, Quartz, Photomasks, Extreme ultraviolet, Chromium, Scanning electron microscopy, Electron beams, Scanning probe microscopy, Ruthenium, Atomic force microscopy

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Proceedings Article | 6 December 2004 Paper

DIVAS: fully automated simulation based mask defect dispositioning and defect management system

Saghir Munir, Daniel Bald, Vikram Tolani, Firoz Ghadiali, Barry Lieberman

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569096

KEYWORDS: Inspection, Photomasks, Databases, Semiconducting wafers, Data archive systems, Computer simulations, Image processing, Defect inspection, Lithography, Critical dimension metrology

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Proceedings Article | 6 December 2004 Paper

Image-based metrology software for analysis of features on masks and wafers

Saghir Munir, Daniel Bald, Vikram Tolani, Horst Haussecker

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569135

KEYWORDS: Scanning electron microscopy, Photomasks, Image segmentation, Metrology, Nonlinear filtering, Semiconducting wafers, Image analysis, Computer aided design, Remote sensing, Databases

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Proceedings Article | 20 August 2004 Paper

Demonstration of damage-free mask repair using electron beam-induced processes

Ted Liang, Alan Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557788

KEYWORDS: Photomasks, Etching, Electron beams, Extreme ultraviolet, Scanning electron microscopy, Ruthenium, Atomic force microscopy, Gases, Chromium, Spatial resolution

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Proceedings Article | 28 May 2004 Paper

Lithography-based automation in the design of program defect masks

George Vakanas, Saghir Munir, Edita Tejnil, Daniel Bald, Rajesh Nagpal

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544536

KEYWORDS: Computer aided design, Photomasks, Inspection, Optical proximity correction, SRAF, Binary data, Image processing, Model-based design, Defect inspection, Resolution enhancement technologies

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Proceedings Article | 2 July 2003 Paper

DIVAS: an integrated networked system for mask defect dispositioning and defect management

Saghir Munir, Dan Bald, Vikram Tolani, Firoz Ghadiali

Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.487634

KEYWORDS: Inspection, Photomasks, Databases, Computer simulations, Control systems, Semiconducting wafers, Scanning electron microscopy, Classification systems, Defect detection, Defect inspection

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Proceedings Article | 27 December 2002 Paper

PRIMADONNA: a system for automated defect disposition of production masks using wafer lithography simulation

Daniel Bald, Saghir Munir, Barry Lieberman, William Howard, Chris Mack

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467768

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Lithography, Image processing, Reticles, Databases, Defect inspection, Infrared imaging, Computer simulations

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Showing 5 of 9 publications

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