Daniel H. Liu
Senior Photo Process Engineer at TDK Headway Technologies
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Etching, Manufacturing, Magnetism, Photomasks, Double patterning technology, Semiconducting wafers, Tolerancing, Chemical mechanical planarization

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Consumer electronics, Mobile devices, Metrology, Cell phones, Resistance, Magnetism, Process control, Critical dimension metrology, Algorithm development, Semiconducting wafers

Proceedings Article | 18 August 2000 Paper
Proc. SPIE. 4181, Challenges in Process Integration and Device Technology
KEYWORDS: Lithography, Optical lithography, Inspection, Scanning electron microscopy, Printing, Photomasks, Mask making, Resolution enhancement technologies

Proceedings Article | 11 June 1999 Paper
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Oxides, Lithography, Optical lithography, Optical properties, Etching, Resistance, Electroluminescence, Printing, Photomasks, Phase shifts

Proceedings Article | 10 June 1994 Paper
Proc. SPIE. 2155, Optoelectronic Signal Processing for Phased-Array Antennas IV
KEYWORDS: Ultrafast phenomena, Laser sources, Modulation, Nonlinear dynamics, Nonlinear optics, Spectral resolution, Optical resolution, Picosecond phenomena, Data conversion, Light

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