Mr. Daniel Sarlette Profile

Daniel Sarlette

Senior Technical Director Lithography at Infineon Technologies

SPIE Involvement:

Author

Proceedings Article | 12 April 2013 Paper

Grayscale lithography: 3D structuring and thickness control

Marcel Heller, Dieter Kaiser, Maik Stegemann, Georg Holfeld, Nicoló Morgana, Jens Schneider, Daniel Sarlette

Proceedings Volume 8683, 868310 (2013) https://doi.org/10.1117/12.2008847

KEYWORDS: Etching, Oxides, Photoresist materials, Photomasks, Semiconducting wafers, Reactive ion etching, Grayscale lithography, Lithography, Ions, Atomic force microscopy

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Proceedings Article | 29 March 2013 Paper

3D lithography for implant applications

Jens Schneider, Henning Feick, Dieter Kaiser, Marcel Heller, Daniel Sarlette

Proceedings Volume 8683, 86831P (2013) https://doi.org/10.1117/12.2008444

KEYWORDS: Photomasks, Grayscale lithography, Lithography, Doping, Silicon, Ion implantation, Photoresist processing, Ions, Semiconducting wafers, Optical lithography

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Proceedings Article | 20 April 2011 Paper

Influence of BARC filtration and materials on the reduction of spire defects

Jens Schneider, Susanne Volkland, Ulrike Feldner, Lincoln O'Riain, Dirk Peters, Felix Braun, Lothar Brencher, Barbara Hornig, Oliver Luxenhofer, Daniel Sarlette

Proceedings Volume 7971, 797128 (2011) https://doi.org/10.1117/12.879431

KEYWORDS: Etching, Contamination, Metals, Lithography, Reliability, Dielectric filters, Semiconducting wafers, Particles, Bottom antireflective coatings, Dielectrics

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Proceedings Article | 23 March 2011 Paper

Source and mask optimization applications in manufacturing

ChinTeong Lim, Vlad Temchenko, Ulrich Klostermann, Vitaliy Domnenko, Jens Schneider, Daniel Sarlette, Ingo Meusel, Dieter Kaiser, Ralf Ploss

Proceedings Volume 7973, 797322 (2011) https://doi.org/10.1117/12.879203

KEYWORDS: Optical proximity correction, Source mask optimization, Scanners, Lithography, Photomasks, Manufacturing, Photovoltaics, Fiber optic illuminators, Reticles, Resolution enhancement technologies

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Proceedings Article | 4 March 2010 Paper

Methods and challenges to extend existing dry 193nm medium NA lithography beyond 90nm

Jens Schneider, Andreas Greiner, ChinTeong Lim, Vlad Temchenko, Felix Braun, Dieter Kaiser, Tarja Hauck, Ingo Meusel, Dietrich Burmeister, Stephan Loehr, Susanne Volkland, Astrid Bauch, Hendrik Kirbach, Daniel Sarlette, Katrin Thiede

Proceedings Volume 7640, 76403G (2010) https://doi.org/10.1117/12.848207

KEYWORDS: Resolution enhancement technologies, Lithography, Optical proximity correction, Semiconducting wafers, Image processing, 193nm lithography, Chemical reactions, Scanners, Etching, Design for manufacturing

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Proceedings Article | 1 June 1990 Paper

Assessment of high-contrast G- and I-line resists using high-numerical-aperture exposure tools

Alois Gutmann, Johann Binder, Guenther Czech, Juergen Karl, Leonhard Mader, Daniel Sarlette, Wolfgang Henke

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20178

KEYWORDS: Optical lithography, Semiconducting wafers, Solids, Monochromatic aberrations, Tolerancing, Reticles, Critical dimension metrology, Photoresist processing, Lithography, Image processing

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Showing 5 of 6 publications

Conference Committee Involvement (10)

38th European Mask and Lithography Conference

19 June 2023 | Dresden, Germany

Optical and EUV Nanolithography XXXVI

27 February 2023 | San Jose, California, United States

Optical and EUV Nanolithography XXXV

25 April 2022 | San Jose, California, United States

Optical Lithography XXXIV

22 February 2021 | Online Only, California, United States

Optical Microlithography XXXIII

25 February 2020 | San Jose, California, United States

Showing 5 of 10 Conference Committees

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