Dr. Daniel Schmidt
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 4 May 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Photoresist materials, Scatterometry, Machine learning, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 2 April 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: X-ray optics, Metrology, Visualization, Gallium arsenide, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Measurement devices, Semiconducting wafers

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Calibration, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 3 October 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Reticles, Metrology, Image processing, Scanners, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 5 September 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Mathematical modeling, Metrology, Data modeling, Scanning electron microscopy, Transmission electron microscopy, Scatterometry, Machine learning, Field effect transistors, Semiconducting wafers, Scatter measurement

Showing 5 of 7 publications
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