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Daniela Matiut
at Fraunhofer IIS
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Author
Publications (1)
Proceedings Article | 12 June 2003 Paper
New models for the simulation of post-exposure bake of chemically amplified resists
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485080
KEYWORDS: Diffusion, Chemically amplified resists, Systems modeling, Calibration, Performance modeling, Lithography, Instrument modeling, Optical lithography, Critical dimension metrology, Device simulation
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