David C. Brandt
Director EUV University Programs at ASML US
SPIE Involvement:
Author
Publications (40)

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Scanners, Laser applications, Laser stabilization, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Tin

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Scattering, Chemical species, Particles, Ions, Hydrogen, Laser scattering, Binary data, Tin

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Tin

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

Showing 5 of 40 publications
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