Dr. David W. Brinkley
at RAVE LLC
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 13 October 2020 Poster + Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Chemistry, Extreme ultraviolet, Molecular machines

Proceedings Article | 4 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, FT-IR spectroscopy, Contamination, Air contamination, Ions, Pellicles, Photomasks, Fluorine, Semiconducting wafers, Adhesives

Proceedings Article | 30 June 2012 Paper
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Mathematical modeling, Nanotechnology, Metrology, Contamination, Nanoparticles, Particles, Inspection, Atomic force microscopy, Photomasks, Defect inspection

Proceedings Article | 17 April 2012 Paper
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Quartz, Air contamination, Image processing, Particles, Inspection, Pellicles, Photomasks, Semiconducting wafers

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reticles, Opacity, Manufacturing, Atomic force microscopy, Photomasks, Source mask optimization, Computational lithography, Optimization (mathematics), Resolution enhancement technologies

Showing 5 of 9 publications
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