Dr. David L. DeMaris Profile

Dr. David L. DeMaris

at IBM - Austin EDA

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 31 March 2014 Paper

Fast detection of novel problematic patterns based on dictionary learning and prediction of their lithographic difficulty

F. de Morsier, D. DeMaris, M. Gabrani, N. Casati

Proceedings Volume 9052, 905211 (2014) https://doi.org/10.1117/12.2045901

KEYWORDS: Associative arrays, Chemical species, Lithography, Field emission displays, Printing, Reconstruction algorithms, Diffraction, Binary data, Detection and tracking algorithms, Image classification

Read Abstract +

Proceedings Article | 31 March 2014 Paper

Automated sample plan selection for OPC modeling

Nathalie Casati, Maria Gabrani, Ramya Viswanathan, Zikri Bayraktar, Om Jaiswal, David DeMaris, Amr Abdo, James Oberschmidt, Andreas Krause

Proceedings Volume 9052, 90520J (2014) https://doi.org/10.1117/12.2045461

KEYWORDS: Data modeling, Surface plasmons, Calibration, Optical proximity correction, Statistical modeling, Optical lithography, Process modeling, Printing, Image processing, Image quality

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Fast source independent estimation of lithographic difficulty supporting large scale source optimization

David DeMaris, Maria Gabrani, Sankha Sarkar, Nathalie Casati, Ronald Luijten, Kafai Lai, Kehan Tian

Proceedings Volume 8326, 832614 (2012) https://doi.org/10.1117/12.916433

KEYWORDS: Optical proximity correction, Lithography, Metals, Source mask optimization, Diffraction, Image quality, Modulation transfer functions, SRAF, Resolution enhancement technologies, Spatial frequencies

Read Abstract +

Proceedings Article | 5 April 2011 Paper

Design specific joint optimization of masks and sources on a very large scale

K. Lai, M. Gabrani, D. Demaris, N. Casati, A. Torres, S. Sarkar, P. Strenski, S. Bagheri, D. Scarpazza, A. Rosenbluth, D. Melville, A. Wächter, J. Lee, V. Austel, M. Szeto-Millstone, K. Tian, F. Barahona, T. Inoue, M. Sakamoto

Proceedings Volume 7973, 797308 (2011) https://doi.org/10.1117/12.879787

KEYWORDS: Source mask optimization, Photomasks, Lithography, Standards development, Algorithm development, Resolution enhancement technologies, Diffraction, Visualization, Photovoltaics

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years