Dr. David S. Fryer Profile

Dr. David S. Fryer

Product Engineer at Siemens EDA

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 13 June 2022 Presentation + Paper

Presentation + Paper

Pareto front optimization for enhanced model prediction accuracy

David Fryer, Ignat Moskalenko, Tung-Yu Wu, Meng-Shiun Chiang, Chun Yen Liao, Tsung-Wei Lin, Chun-Sheng Wu, Chao-Yi Huang, Luke Lo, Xiang Fang, Germain Fenger, Farruh Shahidi

Proceedings Volume 12052, 120520Q (2022) https://doi.org/10.1117/12.2614118

KEYWORDS: Optimization (mathematics), Calibration, Data modeling, Optical proximity correction, Binary data, Performance modeling, Genetic algorithms, Process modeling, Computer simulations, Precision calibration

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Proceedings Article | 22 February 2021 Paper

Paper

Fast rigorous modeling of photoresist in lithography

David Fryer, Ignat Moskalenko, Germain Fenger, Daman Khaira, Yunfei Deng, Yuri Granik

Proceedings Volume 11613, 116130H (2021) https://doi.org/10.1117/12.2584771

KEYWORDS: SRAF, 3D modeling, Printing, Data modeling, 3D printing

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Proceedings Article | 20 October 2016 Paper

Paper

Bayesian analysis for OPC modeling with film stack properties and posterior predictive checking

Andrew Burbine, Germain Fenger, John Sturtevant, David Fryer

Proceedings Volume 10032, 100320N (2016) https://doi.org/10.1117/12.2249680

KEYWORDS: Optical proximity correction, Semiconducting wafers, Data modeling, Refractive index, Calibration, Statistical modeling, Photomasks, Process modeling, Lithography, Monte Carlo methods

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Proceedings Article | 15 March 2016 Paper

Paper

Bayesian inference for OPC modeling

Andrew Burbine, John Sturtevant, David Fryer, Bruce Smith

Proceedings Volume 9780, 97800I (2016) https://doi.org/10.1117/12.2219707

KEYWORDS: Data modeling, Optical proximity correction, Bayesian inference, Lithography, 3D modeling, Calibration, Metrology

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SPIE Journal Paper | 16 February 2016

Accurate, full-chip, three-dimensional electromagnetic field model for non-Manhattan mask corners

Michael Lam, Chris Clifford, Mike Oliver, David Fryer, Edita Tejnil, Kostas Adam

JM3, Vol. 15, Issue 02, 021204, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021204

KEYWORDS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology

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Proceedings Article | 18 March 2015 Paper

Paper

Accurate, full chip 3D electromagnetic field model for non-Manhattan mask corners

Michael Lam, Chris Clifford, Michael Oliver, David Fryer, Edita Tejnil, Kostas Adam

Proceedings Volume 9426, 94260P (2015) https://doi.org/10.1117/12.2085671

KEYWORDS: 3D modeling, Photomasks, Near field, Critical dimension metrology, Semiconducting wafers, Lithography, Image quality, Data transmission, Electromagnetism, Diffraction

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Proceedings Article | 18 March 2015 Paper

Paper

Akaike information criterion to select well-fit resist models

Andrew Burbine, David Fryer, John Sturtevant

Proceedings Volume 9427, 94270J (2015) https://doi.org/10.1117/12.2085770

KEYWORDS: Data modeling, Calibration, Statistical modeling, Mathematical modeling, Optical proximity correction, Photoresist materials, Process modeling, Systems modeling, Stochastic processes, Visualization

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Proceedings Article | 18 March 2015 Paper

Paper

Evaluation of compact models for negative-tone development layers at 20/14nm nodes

Ao Chen, Yee Mei Foong, Dong Qing Zhang, Hongxin Zhang, Angeline Chung, David Fryer, Yunfei Deng, Dmitry Medvedev, Yuri Granik

Proceedings Volume 9426, 94261P (2015) https://doi.org/10.1117/12.2085711

KEYWORDS: Data modeling, Calibration, Photomasks, Wafer-level optics, Performance modeling, Semiconducting wafers, Photoresist processing, Optical proximity correction, SRAF, 3D modeling

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Proceedings Article | 17 October 2014 Paper

Paper

14-nm photomask simulation sensitivity

John Sturtevant, Peter Buck, Steffen Schulze, David Fryer, Edita Tejnil, Kostas Adam, Michael Lam, Chris Clifford, Mike Oliver, Ana Armeanu, Franklin Kalk, Kent Nakagawa, Guoxiang Ning, Paul Ackmann, Fritz Gans, Christian Buergel

Proceedings Volume 9231, 92310I (2014) https://doi.org/10.1117/12.2066483

KEYWORDS: Photomasks, 3D modeling, Semiconducting wafers, Optical proximity correction, Data modeling, Calibration, Manufacturing, Photoresist materials, Metrology, Refractive index

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Proceedings Article | 31 March 2014 Paper

Paper

Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk

David Fryer, Michael Lam, Kostas Adam, Chris Clifford, Mike Oliver, Christian Zuniga, John Sturtevant, ChangAn Wang, Scott Mansfield

Proceedings Volume 9052, 905216 (2014) https://doi.org/10.1117/12.2046489

KEYWORDS: Photomasks, 3D modeling, Calibration, Source mask optimization, Data modeling, Semiconducting wafers, Performance modeling, Tolerancing, Metrology, Manufacturing

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Proceedings Article | 28 March 2014 Paper

Paper

Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

J. Andres Torres, Kyohei Sakajiri, David Fryer, Yuri Granik, Yuansheng Ma, Polina Krasnova, Germain Fenger, Seiji Nagahara, Shinichiro Kawakami, Benjamen Rathsack, Gurdaman Khaira, Juan de Pablo, Julien Ryckaert

Proceedings Volume 9053, 90530R (2014) https://doi.org/10.1117/12.2045328

KEYWORDS: Monte Carlo methods, Manufacturing, Lithography, Metals, Photomasks, Optical lithography, Directed self assembly, Visualization, Polymers, Design for manufacturability

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Proceedings Article | 12 April 2013 Paper

Paper

Accurate 3DEMF mask model for full-chip simulation

Michael Lam, Kostas Adam, David Fryer, Christian Zuniga, Haiqing Wei, Michael Oliver, Chris Clifford

Proceedings Volume 8683, 86831D (2013) https://doi.org/10.1117/12.2013167

KEYWORDS: Photomasks, Polarization, Scattering, Near field, Light scattering, Optical proximity correction, Semiconducting wafers, Systems modeling, Error analysis, Solids

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Proceedings Article | 29 March 2006 Paper

Paper

Defect marginality screen for resists patterned in random bright-field layout

David Fryer, Vivek Singh, Andrew Muray, Sushil Dhoot, Sam Sivakumar

Proceedings Volume 6153, 61530U (2006) https://doi.org/10.1117/12.658060

KEYWORDS: Stereolithography, Lithography, Optical lithography, Photomasks, FT-IR spectroscopy, Data modeling, Resolution enhancement technologies, Reticles, Model-based design, Photoresist materials

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Proceedings Article | 29 March 2006 Paper

Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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Proceedings Article | 14 May 2004 Paper

Paper

Proximity correction and k1 performance for resists with nonoptical patterning response

David Fryer, Vivek Singh, Thanh Phung, Peng Liu

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537701

KEYWORDS: Data modeling, Optical lithography, Photomasks, Interfaces, Systems modeling, Scanning electron microscopy, Oxides, Thermal effects, Optical proximity correction, Lithography

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Proceedings Article | 23 June 2000 Paper

Paper

Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness

Mark Somervell, David Fryer, Brian Osborn, Kyle Patterson, Sungseo Cho, Jeff Byers, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388311

KEYWORDS: Polymers, Line edge roughness, Glasses, Semiconducting wafers, Imaging systems, Etching, FT-IR spectroscopy, Photoresist materials, Image resolution, Absorbance

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Proceedings Article | 25 June 1999 Paper

Paper

Local thermal analysis of reaction and the glass transition in exposed resist

David Fryer, Juan de Pablo, Paul Nealey

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351159

KEYWORDS: Thermal analysis, Glasses, Photoresist materials, Temperature metrology, Polymers, Lithography, Wheatstone bridges, Chemically amplified resists, Thin films, Photoresist processing

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Proceedings Article | 29 June 1998 Paper

Paper

Photoresist and the photoresist/wafer interface with a local thermal probe

David Fryer, Juan de Pablo, Paul Nealey

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312391

KEYWORDS: Photoresist materials, Thermal analysis, Ellipsometry, Glasses, Silicon films, Temperature metrology, Silicon, Polymers, Polymethylmethacrylate, Thin films

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Proceedings Article | 8 June 1998 Paper

Paper

Application of scanning thermal microscopy to the study of thermophysical properties of ultrathin photoresist films

Fernando Escobedo, David Fryer, Juan de Pablo

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308791

KEYWORDS: Glasses, Polymers, Polymer thin films, Photoresist materials, Temperature metrology, Thin films, Interfaces, Microscopy, Monte Carlo methods, Molecules

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Showing 5 of 19 publications

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