David E. Godfrey
Senior Applications Engineer
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Data modeling, Calibration, Scanners, Printing, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Monochromatic aberrations, Optical lithography, Scanners, Distortion, Scanning electron microscopy, Phase measurement, Critical dimension metrology, Spherical lenses, Semiconducting wafers, Scatter measurement

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