Dr. David Gready Profile

Dr. David Gready

Research Scientist at KLA Oregon

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Author

Publications (5)

Proceedings Article | 24 March 2016 Paper

Overlay metrology performance prediction fidelity: the factors enabling a successful target design cycle

Inna Tarshish-Shapir, Eitan Hajaj, Greg Gray, Jeffery Hodges, Jianming Zhou, Sarah Wu, Sam Moore, Guy Ben-Dov, Chen Dror, Ze'ev Lindenfeld, David Gready, Mark Ghinovker, Mike Adel

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Metrology, Overlay metrology, Electromagnetic simulation, Reflectivity, Diffraction, Semiconducting wafers, Inspection, Scatterometry, Polarization, Device simulation, Interference (communication), Optical design, Light sources

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Proceedings Article | 8 March 2016 Paper

Metrology target design simulations for accurate and robust scatterometry overlay measurements

Guy Ben-Dov, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Mike Adel, Eitan Herzel, Soonho Oh, DongSub Choi, Sang Hyun Han, Mohamed El Kodadi, Chan Hwang, Jeongjin Lee, Seung Yoon Lee, Kuntack Lee

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Overlay metrology, Metrology, Critical dimension metrology, Scatterometry, Optical testing, Image processing, Scatter measurement, Optical metrology, Diffraction gratings, Diffraction, Semiconducting wafers, Wafer testing, Device simulation

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Proceedings Article | 10 April 2015 Paper

Stack and topography verification as an enabler for computational metrology target design

Michael Adel, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Chen Dror, Stephane Godny

Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX

KEYWORDS: Metrology, Scanning electron microscopy, Diffraction gratings, Overlay metrology, Uncertainty analysis, Performance modeling, Diffraction, Scatterometry, Critical dimension metrology, Image processing

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Proceedings Article | 17 February 2011 Paper

1.55 μm directly modulated CCIG lasers fabricated by surface-defined lateral feedback gratings

Sohaib Afzal, Florian Schnabel, Wenzel Scholz, Johann-Peter Reithmaier, Gadi Eisenstein, David Gready, Olivier Parillaud, Michel Krakowski, Ivo Montrosset, Marco Vallone

Proc. SPIE. 7953, Novel In-Plane Semiconductor Lasers X

KEYWORDS: Modulation, Laser development, Etching, Optical design, Lithography, Semiconductor lasers, Quantum wells, Nanoimprint lithography, Phase shift keying, Electron beam lithography

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Proceedings Article | 17 February 2011 Paper

Development of high-speed directly modulated DFB and DBR lasers with surface gratings

M. Dumitrescu, J. Telkkälä, J. Karinen, J. Viheriälä, A. Laakso, S. Afzal, J.-P. Reithmaier, M. Kamp, P. Melanen, P. Uusimaa, P. Bardella, M. Vallone, I. Montrosset, O. Parillaud, M. Krakowski, D. Gready, G. Eisenstein, G. Sek

Proc. SPIE. 7953, Novel In-Plane Semiconductor Lasers X

KEYWORDS: Modulation, Refractive index, Scanning electron microscopy, Etching, Distributed Bragg reflectors, Laser development, Phase shift keying, Resistance, Waveguides, Cladding

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