Dr. David Gready
Research Scientist at KLA Oregon
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Overlay metrology, Electromagnetic simulation, Reflectivity, Diffraction, Semiconducting wafers, Inspection, Scatterometry, Polarization, Device simulation, Interference (communication), Optical design, Light sources

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Overlay metrology, Metrology, Critical dimension metrology, Scatterometry, Optical testing, Image processing, Scatter measurement, Optical metrology, Diffraction gratings, Diffraction, Semiconducting wafers, Wafer testing, Device simulation

Proceedings Article | 10 April 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Scanning electron microscopy, Diffraction gratings, Overlay metrology, Uncertainty analysis, Performance modeling, Diffraction, Scatterometry, Critical dimension metrology, Image processing

Proceedings Article | 17 February 2011 Paper
Proc. SPIE. 7953, Novel In-Plane Semiconductor Lasers X
KEYWORDS: Modulation, Laser development, Etching, Optical design, Lithography, Semiconductor lasers, Quantum wells, Nanoimprint lithography, Phase shift keying, Electron beam lithography

Proceedings Article | 17 February 2011 Paper
Proc. SPIE. 7953, Novel In-Plane Semiconductor Lasers X
KEYWORDS: Modulation, Refractive index, Scanning electron microscopy, Etching, Distributed Bragg reflectors, Laser development, Phase shift keying, Resistance, Waveguides, Cladding

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