Prof. David C. Joy
Professor at Univ of Tennessee
SPIE Involvement:
Author | Instructor
Publications (31)

Proceedings Article | 15 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Microscopes, Metrology, Spatial frequencies, Ions, Image resolution, Electron microscopes, Scanning electron microscopy, Signal processing, Spatial resolution, Contrast transfer function

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Gold, Metrology, Copper, Ions, Silver, Monte Carlo methods, Ion beams, Solids, Aluminum, Helium

Proceedings Article | 10 September 2007 Paper
Proc. SPIE. 6648, Instrumentation, Metrology, and Standards for Nanomanufacturing
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Calibration, Silicon, Scanning electron microscopy, Raster graphics, Semiconducting wafers, Standards development, Diffraction gratings

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Metrology, Calibration, Silicon, Hydrogen, Scanning electron microscopy, Line edge roughness, Standards development

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Microscopes, Electron beams, Metrology, Ions, Image resolution, Scanning electron microscopy, Ion beams, Image enhancement, Signal generators, Helium

Showing 5 of 31 publications
Proceedings Volume Editor (6)

Showing 5 of 6 publications
Conference Committee Involvement (22)
Scanning Microscopies 2014
16 September 2014 | Monterey, California, United States
Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
24 April 2012 | Baltimore, Maryland, United States
Metrology, Inspection, and Process Control for Microlithography XXVI
13 February 2012 | San Jose, California, United States
Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
26 April 2011 | Orlando, Florida, United States
Metrology, Inspection, and Process Control for Microlithography XXV
28 February 2011 | San Jose, California, United States
Showing 5 of 22 Conference Committees
Course Instructor
SC955: Software for Scanning Microscopy
This course introduces attendees to computer software which can interpret SEM images, interpret X-ray analytical data, and simulate signal generation processes. Programs to be demonstrated include, IMAGE-J, DTSA II, and a variety of Monte Carlo simulations for both PC and Mac. The goal of the course is to make you feel comfortable in using these programs by providing both some background to what the software does and detailed step by step instructions for problem solving. We will work through typical applications of each package to familiarize you with the procedures for data input and output and program set-up, and identify known limitations and problems with implementations of the programs on different computers. A full set of notes on each program, and every example, will be provided.
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