David H. Kim
Product Solution Sales Manager at Synopsys Korea Inc
SPIE Involvement:
Publications (24)

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Photomasks, Lithography, Optical lithography, Optical proximity correction, Chromium, Model-based design, Logic, Optimization (mathematics), Semiconducting wafers, Critical dimension metrology

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Extreme ultraviolet, Photomasks, Calibration, Scanning electron microscopy, Inspection, Image processing, Defect detection, Computational lithography, Image analysis, Transmission electron microscopy

Proceedings Article | 4 April 2011 Paper
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Source mask optimization, Photovoltaics, Optical lithography, Optimization (mathematics), Detection and tracking algorithms, Electroluminescence, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Overlay metrology, Logic

Showing 5 of 24 publications
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