Mr. David A. Markle Profile

David A. Markle

Consultant

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 7 July 1997 Paper

Scanning array lens lithography for large-area applications

Lawrence Wang, David Markle, Raymond Ellis

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275788

KEYWORDS: Reticles, Relays, Lithography, Prototyping, Scanning electron microscopy, Lens design, Lamps, Head, Micromachining, Feature extraction

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Proceedings Article | 13 September 1996 Paper

New array lens optical system for large-area micromachining lithography

Lawrence Wang, David Markle, Raymond Ellis, Hwan Jeong

Proceedings Volume 2880, (1996) https://doi.org/10.1117/12.250964

KEYWORDS: Lithography, Relays, Micromachining, Reticles, Prototyping, Mercury, Image resolution, Mirrors, Photomasks, Optical design

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Proceedings Article | 8 September 1995 Paper

Combining ion figuring and SPSI testing to produce a high-quality aspheric 18-inch-diameter f/2 mirror

Frank Carbone, David Markle

Proceedings Volume 2536, (1995) https://doi.org/10.1117/12.218411

KEYWORDS: Mirrors, Ions, Interferometers, Saturn, Surface finishing, Aspheric lenses, Optical spheres, Data acquisition, Polishing, Phase interferometry

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Proceedings Article | 7 December 1994 Paper

Two-level masks for increased depth of focus

Rudolf von Buenau, Ricardo Diola, Paul DePesa, Stanney Kay, David Markle, Elizabeth Tai, Roger Fabian Pease

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195837

KEYWORDS: Photomasks, Reflectivity, Photomask technology, Photoresist materials, Aluminum, Thin films, Head, Opacity, Solids, Lithography

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Proceedings Article | 15 February 1994 Paper

Masks for Markle-Dyson optics

Andrew Grenville, Gerry Owen, Jeff Robinson, David Borkholder, Curtis Frank, Roger Fabian Pease, David Markle

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167246

KEYWORDS: Photomasks, Etching, Reflectivity, Aluminum, Reflectors, Reflection, Quartz, Projection systems, Tolerancing, Silicon films

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Conference Committee Involvement (1)

SPIE Advanced Lithography

21 February 2010 | San Jose, United States

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