Dr. David R.G. Mitchell Profile

Dr. David R.G. Mitchell

Research Scientist at ANSTO

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Author

Publications (4)

Proceedings Article | 9 December 2016 Paper

Seed mediated one-pot growth of versatile heterogeneous upconversion nanocrystals for multimodal bioimaging

Shihui Wen, Du Li, Deming Liu, Xiaoxue Xu, Yi Du, David Mitchell, Bingyang Shi, Xiangyang Shi, Dayong Jin

Proceedings Volume 10013, 1001315 (2016) https://doi.org/10.1117/12.2245172

KEYWORDS: Nanocrystals, Upconversion, Sodium, Lanthanides, Nanorods, Magnetic resonance imaging, Computed tomography, Luminescence, In vivo imaging, Particles

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Proceedings Article | 20 August 2005 Paper

Atomic layer deposition of TiO2 / Al2O3 films for optical applications

Gerry Triani, Peter Evans, David Mitchell, Darren Attard, Kim Finnie, Michael James, Tracey Hanley, Bruno Latella, Kathryn Prince, John Bartlett

Proceedings Volume 5870, 587009 (2005) https://doi.org/10.1117/12.638039

KEYWORDS: Atomic layer deposition, Aluminum, Silicon, Transmission electron microscopy, Silicon films, Refractive index, Glasses, Interfaces, X-rays, Dielectrics

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Proceedings Article | 2 April 2004 Paper

Atomic layer deposition (ALD) of TiO2 and Al2O3 thin films on silicon

David Mitchell, Gerry Triani, Darren Attard, Kim Finnie, Peter Evans, Christophe Barbe, John Bartlett

Proceedings Volume 5276, (2004) https://doi.org/10.1117/12.531795

KEYWORDS: Atomic layer deposition, Thin films, Silicon, Silicon films, Multilayers, Microelectromechanical systems, Microelectronics, Photonics, Metals, Titanium dioxide

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Proceedings Article | 2 April 2004 Paper

Characterization of thin metal oxide films grown by atomic layer deposition

Peter Evans, Kathryn Prince, Gerry Triani, Kim Finnie, David Mitchell, Christophe Barbe

Proceedings Volume 5276, (2004) https://doi.org/10.1117/12.524052

KEYWORDS: Aluminum, Atomic layer deposition, Silicon, Thin films, Microelectromechanical systems, Metals, Multilayers, Oxides, Ions, Chlorine

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