Mr. David W. Myers Profile

David W. Myers

Vice President EUV Development at Cymer LLC

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 17 April 2014 Paper

Paper

Laser produced plasma light source development for HVM

Michael Purvis, Robert Kazinczi, Alberto Pirati, Silvia De Dea, Robert Rafac, Daniel Riggs, David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith

Proceedings Volume 9048, 904835 (2014) https://doi.org/10.1117/12.2048195

KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Light sources, Deep ultraviolet, Laser development, Hydrogen, Laser applications

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Proceedings Article | 18 March 2014 Paper

Paper

LPP EUV source readiness for NXE 3300B

Silvia De Dea, Daniel Riggs, Robert Rafac, David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Alberto Pirati, Robert Kazinczi, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith

Proceedings Volume 9048, 90480C (2014) https://doi.org/10.1117/12.2048184

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Control systems, Tin, Reflectivity, Mirrors, Pulsed laser operation, Laser scanners

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Proceedings Article | 1 April 2013 Paper

Paper

Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond

Norbert Böwering, Alex Ershov, David Brandt, Igor Fomenkov, David Myers, Daniel Brown, Bruno La Fontaine, Nigel Farrar

Proceedings Volume 8679, 86792I (2013) https://doi.org/10.1117/12.2012695

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Plasma, Light sources, Carbon dioxide lasers, Neodymium, Optical lithography, Laser development, Metrology

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Proceedings Article | 1 April 2013 Paper

Paper

CO2/Sn LPP EUV sources for device development and HVM

Igor Fomenkov, David Myers, Daniel Brown, Bruno La Fontaine, Nigel Farrar, David Brandt, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

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SPIE Journal Paper | 29 June 2012

Development of stable extreme-ultraviolet sources for use in lithography exposure systems

Igor Fomenkov, Bruno La Fontaine, Daniel Brown, Imtiaz Ahmad, Peter Baumgart, Norbert Bowering, David Brandt, Alexander Bykanov, Silvia De Dea, Alex Ershov, Nigel Farrar, Daniel Golich, Michael Lercel, David Myers, Chirag Rajyaguru, Shailendra Srivastava, Yezheng Tao, Georgiy Vaschenko

JM3, Vol. 11, Issue 02, 021110, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021110

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

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Proceedings Article | 23 March 2012 Paper

Paper

Laser produced plasma EUV sources for device development and HVM

Alex Ershov, Peter Porshnev, Michael Woolston, Richard Sandstrom, Robert Jacques, Igor Fomenkov, Michael Lercel, Palash Das, Robert Bergstedt, Wayne Dunstan, Toshi Ishihara, Vladimir Fleurov, Yezheng Tao, David Brandt, Rod Simmons, Robert Rafac, Alexander Bykanov, Imtiaz Ahmad, Bruno La Fontaine, Kevin Zhang, Chirag Rajyaguru, Christian Wittak, Shailendra Srivastava, Norbert Böwering, Georgiy Vaschenko, Daniel Brown, Silvia De Dea, Alexander Schafgans, Jonathan Grava, Peter Baumgart, David Myers

Proceedings Volume 8322, 83221I (2012) https://doi.org/10.1117/12.916521

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Mirrors, Coating, Manufacturing, Tin, Semiconducting wafers, Laser scanners

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Proceedings Article | 23 March 2012 Paper

Paper

Light sources for EUV lithography at the 22-nm node and beyond

David Myers, Alexander Bykanov, Igor Fomenkov, David Brandt, Michael Lercel, Bruno La Fontaine, Alex Ershov, Daniel Brown, Norbert Böwering

Proceedings Volume 8322, 83222N (2012) https://doi.org/10.1117/12.916531

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Ions, Plasma, Carbon dioxide lasers, Light sources, Control systems, Reflectivity, Mirrors

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Proceedings Article | 8 April 2011 Paper

Paper

Development of an in-situ Sn cleaning method for extreme ultraviolet light lithography

D. Ruzic, D. Myers, R. Lofgren, O. Khodykin, J. Sporre

Proceedings Volume 7969, 796929 (2011) https://doi.org/10.1117/12.881634

KEYWORDS: Tin, Etching, Plasma, Hydrogen, Extreme ultraviolet, Ions, Extreme ultraviolet lithography, Silicon, Lithography, Temperature metrology

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Proceedings Article | 8 April 2011 Paper

Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Robert Jacques, Robert Bergstedt, Daniel Brown, Norbert Böwering, Alex Ershov, Peter Baumgart, Bruno La Fontaine, Oleh Khodykin, Richard Sandstrom, Rod Simmons, Alexander Bykanov, Palash Das, Wayne Dunstan, Chirag Rajyaguru, Richard Hou, Shailendra Srivastava, Vladimir Fleurov, Silvia De Dea, William Partlo, Kevin Zhang, Imtiaz Ahmad, Georgiy Vaschenko, David Brandt, David Myers, Toshihiko Ishihara

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

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Proceedings Article | 7 April 2011 Paper

Paper

LPP source system development for HVM

Shailendra Srivastava, Vladimir Fleurov, Norbert Böwering, Silvia De Dea, Georgiy Vaschenko, Wayne Dunstan, Imtiaz Ahmad, Alexander Bykanov, Chirag Rajyaguru, Robert Jacques, Palash Das, David Brandt, Christian Wittak, Robert Bergstedt, Toshihiko Ishihara, Rod Simmons, Igor Fomenkov, Alex Ershov, Peter Baumgart, Richard Sandstrom, Michael Lercel, Bruno La Fontaine, Richard Hou, Oleh Khodykin, William Partlo, David Myers, Daniel Golich, Kevin Zhang

Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

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Proceedings Article | 23 March 2010 Paper

Paper

Laser-produced plasma light source for EUVL

Richard Hou, William Partlo, David Brandt, Kevin O'Brien, Daniel Golich, Imtiaz Ahmad, Igor Fomenkov, Alex Ershov, Alexander Bykanov, Chirag Rajyaguru, Richard Sandstrom, Wayne Dunstan, Oleh Khodykin, Silvia De Dea, Shailendra Srivastava, Norbert Böwering, David Myers, Georgiy Vaschenko

Proceedings Volume 7636, 763639 (2010) https://doi.org/10.1117/12.848408

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Carbon dioxide lasers, Reflectivity, Tin, Plasma, Manufacturing, Mirrors, Ions, Light sources

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Proceedings Article | 20 March 2010 Paper

Paper

LPP source system development for HVM

Imtiaz Ahmad, Chirag Rajyaguru, Richard Sandstrom, Alexander Bykanov, Norbert Böwering, David Myers, Alex Ershov, William Partlo, Wayne Dunstan, Richard Hou, Kevin O'Brien, Igor Fomenkov, Oleh Khodykin, Shailendra Srivastava, Daniel Golich, Georgiy Vaschenko, Silvia De Dea, David Brandt

Proceedings Volume 7636, 76361I (2010) https://doi.org/10.1117/12.848404

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Manufacturing, Prototyping, Tin, Mirrors, Laser scanners

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SPIE Journal Paper | 1 October 2009

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Norbert Böwering, Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, Dave Myers, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

JM3, Vol. 8, Issue 04, 041504, (October 2009) https://doi.org/10.1117/12.10.1117/1.3224942

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

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Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma light source for EUVL

Alex Ershov, Alexander Bykanov, Dave Myers, David Vidusek, Igor Fomenkov, David Brandt, Silvia De Dea, Richard Hou, William Partlo, Daniel Golich, Norbert Böwering, Shailendra Srivastava, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Georgiy Vaschenko, Nigel Farrar

Proceedings Volume 7271, 727138 (2009) https://doi.org/10.1117/12.814272

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Extreme ultraviolet lithography, Sensors, Carbon dioxide lasers, Mirrors, Tin, Coating, Light sources

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Proceedings Article | 18 March 2009 Open Access

Open Access

Paper

LPP source system development for HVM

David Myers, Chirag Rajyaguru, David Vidusek, Igor Fomenkov, Norbert Böwering, Shailendra Srivastava, Oleh Khodykin, Georgiy Vaschenko, Imtiaz Ahmad, William Partlo, Alexander Bykanov, Alex Ershov, Richard Hou, David Brandt, Nigel Farrar, Daniel Golich, Jerzy Hoffman, Silvia De Dea, Christopher Chrobak

Proceedings Volume 7271, 727103 (2009) https://doi.org/10.1117/12.814228

KEYWORDS: Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Mirrors, Tin, Plasma, Coating, Scanners, Manufacturing, Light sources

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Proceedings Article | 4 December 2008 Paper

Paper

Laser-produced plasma source system development

Alex Ershov, Shailendra Srivastava, Alexander Bykanov, Georgiy Vaschenko, Silvia De Dea, Igor Fomenkov, Jerzy Hoffman, David Myers, David Vidusek, Oleh Khodykin, Christopher Chrobak, William Partlo, Norbert Böwering, David Brandt, Richard Hou

Proceedings Volume 7140, 71401E (2008) https://doi.org/10.1117/12.806648

KEYWORDS: Extreme ultraviolet, Plasma, Reflectivity, Mirrors, Extreme ultraviolet lithography, Tin, Plasma systems, Manufacturing, Light sources, Carbon dioxide lasers

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This paper provides a review of development progress for a laser-produced-plasma (LPP) extreme-ultra-violet (EUV) source with performance goals targeted to meet joint requirements from all leading scanner manufacturers. Laser produced plasma systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at sub-32nm and beyond nodes on the ITRS roadmap. Recent advances in the development of the system, its present average output power level and progress with various subcomponents is discussed. We present the latest results on peak EUV and average EUV power as well as stability of EUV output, measured in burst-mode operation at the nominal repetition rate of the light source. In addition, our progress in developing of critical components, such as normal-incidence EUV collector and liquid-target delivery system is described. We also report on dose stability, plasma position stability and EUV distribution at the output region of the source. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source. The capability to scale LPP power by further development of the high power CO2 drive laser in order to increase duty cycle and duration of continuous light source operation is shown. Production systems with thermal management and capable of 5 sr light collection are being assembled and tested. A description of the development of a normal-incidence ellipsoidal collector is included. Improvements in substrate quality lead to increased EUV reflectance of the mirror. Results on the generation of liquid tin droplets as target material for efficient plasma generation are also described. The droplet generator serves as a key element in the precise and spatially stable delivery of small quantities of liquid tin at high repetition rates. We describe a protection module at the intermediate focus (IF) region of the source and imaging of the EUV distribution using a sub-aperture collector and a fluorescent screen. A path to meet requirements for production scanners planned well into the next decade is also presented.

Proceedings Article | 21 March 2007 Paper

Paper

Laser-produced plasma source system development

Alexander Ershov, Rodney Simmons, Jerzy Hoffman, Igor Fomenkov, David Myers, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, William Partlo, David Brandt, Norbert Böwering, Juan Chavez, Christopher Chrobak, Ernesto Vargas L.

Proceedings Volume 6517, 65173J (2007) https://doi.org/10.1117/12.713454

KEYWORDS: Extreme ultraviolet, Ions, Gas lasers, Plasma, Tin, Spectroscopy, Carbon monoxide, Extreme ultraviolet lithography, Calibration, Sensors

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This paper describes the development of laser produced plasma (LPP) technology as an EUV source for advanced scanner lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for critical layer patterning below 32 nm beginning with beta generation scanners in 2009. This paper describes the development status of subsystems most critical to the performance to meet joint scanner manufacturer requirements and semiconductor industry standards for reliability and economic targets for cost of ownership. The intensity and power of the drive laser are critical parameters in the development of extreme ultraviolet LPP lithography sources. The conversion efficiency (CE) of laser light into EUV light is strongly dependent on the intensity of the laser energy on the target material at the point of interaction. The total EUV light generated then scales directly with the total incident laser power. The progress on the development of a short pulse, high power CO2 laser for EUV applications is reported. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. The deposition of target materials and contaminants, as well as sputtering of the collector multilayer coating and implantation of incident particles can reduce the reflectivity of the mirror substantially over the exposure time even though debris mitigation schemes are being employed. The results of measurements of high energy ions generated by a short-pulse CO2 laser on a laser-produced plasma EUV light source with Sn target are presented. Droplet generation is a key element of the LPP source being developed at Cymer for EUV lithography applications. The main purpose of this device is to deliver small quantities of liquid target material as droplets to the laser focus. The EUV light in such configuration is obtained as a result of creating a highly ionized plasma from the material of the droplets. Liquid tin is the material of choice to be used as a target due to the relatively high CE of the laser energy into in-band EUV radiation. Results obtained with the droplet generator and technical challenges related to successful implementation of the device are discussed.

Proceedings Article | 19 March 2007 Paper

Paper

LPP EUV source development for HVM

Juan Chavez, David Myers, David Brandt, Oleh Khodykin, Alexander Bykanov, William Partlo, Alex Ershov, Ernesto Vargas L., Jerzy Hoffman, Igor Fomenkov, Norbert Böwering, Rodney Simmons, Christopher Chrobak, Georgiy Vaschenko

Proceedings Volume 6517, 65170Q (2007) https://doi.org/10.1117/12.713279

KEYWORDS: Extreme ultraviolet, Gas lasers, Plasmas, Tin, Mirrors, Reflectivity, Extreme ultraviolet lithography, Carbon monoxide, Ions, Scanners

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Proceedings Article | 24 March 2006 Paper

Paper

EUV source collector

Juan Chavez, Björn Hansson, William Marx, Norbert Böwering, David Myers, Alex Ershov, Oleh Khodykin, David Brandt, Ernesto Vargas L., Igor Fomenkov

Proceedings Volume 6151, 61513R (2006) https://doi.org/10.1117/12.656462

KEYWORDS: Mirrors, Extreme ultraviolet, Coating, Reflectivity, Multilayers, Plasma, Tin, Solids, Light sources, Atomic force microscopy

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Proceedings Article | 24 March 2006 Paper

Paper

High-temperature LPP collector mirror

Norbert Kaiser, Torsten Feigl, Sergiy Yulin, Oleh Khodykin, Kent Bruzzone, Alex Ershov, Nicolas Benoit, Igor Fomenkov, David Myers, John Viatella, Norbert Böwering

Proceedings Volume 6151, 61514A (2006) https://doi.org/10.1117/12.662138

KEYWORDS: Mirrors, Reflectivity, Multilayers, Coating, Extreme ultraviolet, Silicon, Annealing, Atomic force microscopy, Silicon carbide, Temperature metrology

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Proceedings Article | 23 March 2006 Paper

Paper

LPP EUV source development for HVM

Igor Fomenkov, David Myers, William Partlo, Curtis Rettig, Ernesto Vargas, David Brandt, Rod Simmons, Jerzy Hoffman, Alexander Bykanov, Alex Ershov, Juan Chavez, Norbert Böwering, Björn Hansson, Oleh Khodykin, William Marx

Proceedings Volume 6151, 61510R (2006) https://doi.org/10.1117/12.656687

KEYWORDS: Extreme ultraviolet, Tin, Plasma, Lithium, Extreme ultraviolet lithography, Mirrors, Ions, Prototyping, Reflectivity, Metrology

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Proceedings Article | 6 May 2005 Paper

Paper

EUV source system development update: advancing along the path to HVM

B. Klene, B. Hansson, I. Fomenkov, D. Myers, D. Brandt

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601052

KEYWORDS: Extreme ultraviolet, Lithium, Ions, Tin, Mirrors, Extreme ultraviolet lithography, Plasma, Xenon, Excimer lasers, Neodymium lasers

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Proceedings Article | 6 May 2005 Paper

Paper

LPP EUV conversion efficiency optimization

O. Khodykin, W. Partlo, A. Ershov, I. Fomenkov, D. Myers, J. Hoffman, A. Bykanov

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601048

KEYWORDS: Tin, Extreme ultraviolet, Lithium, Plasma, Pulsed laser operation, Laser energy, Spectroscopy, Light, CCD cameras, Image analysis

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Proceedings Article | 26 July 1999 Paper

Paper

Production-ready 2-kHz KrF excimer laser for DUV lithography

Christopher Hysham, Thomas Hofmann, Paolo Zambon, Palash Das, Gunasiri Padmabandu, Richard Dunning, William Partlo, Tom Watson, Dave Myers

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354309

KEYWORDS: Lithography, Excimer lasers, Control systems, Reliability, Laser stabilization, Safety, Laser systems engineering, Deep ultraviolet, Manufacturing, Semiconductor lasers

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Proceedings Article | 29 June 1998 Paper

Paper

Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-um line widths

Igor Fomenkov, William Partlo, Palash Das, Dave Myers, Thomas Hofmann, George Everage, Alexander Ershov

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310732

KEYWORDS: Laser stabilization, Pulsed laser operation, Excimer lasers, Diffraction gratings, Lithography, Optical lithography, Prisms, Gas lasers, Laser cutting, Laser scanners

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Showing 5 of 25 publications

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