Prof. David Z. Pan Profile

Prof. David Z. Pan

Professor at Univ of Texas at Austin

SPIE Involvement:

Conference Program Committee | Author

Websites:

Personal Website

Publications (53)

Proceedings Article | 10 April 2024 Presentation + Paper

Open-source differentiable lithography imaging framework

Guojin Chen, Hao Geng, Bei Yu, David Pan

Proceedings Volume 12954, 129540J (2024) https://doi.org/10.1117/12.3009980

KEYWORDS: Lithography, Latex, Source mask optimization, Photomasks, Performance modeling, Systems modeling, Computational lithography, Computer programming, Optical lithography, Mathematical optimization

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Proceedings Article | 11 March 2024 Presentation + Paper

A hardware-efficient silicon electronic-photonic chip for optical structured neural networks

Shupeng Ning, Jiaqi Gu, Chenghao Feng, Rongxing Tang, Hanqing Zhu, David Pan, Ray Chen

Proceedings Volume 12892, 1289204 (2024) https://doi.org/10.1117/12.3000787

KEYWORDS: Matrices, Convolution, Neural networks, Modulation, Education and training, Computer hardware, Silicon, Chemical elements, Artificial intelligence, Surgery

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Proceedings Article | 9 March 2023 Presentation

Light-AI interaction: the convergence of photonic AI and cross-layer circuit-architecture-algorithm co-design

Jiaqi Gu, Chenghao Feng, Hanqing Zhu, Ray Chen, David Pan

Proceedings Volume PC12427, PC1242701 (2023) https://doi.org/10.1117/12.2653932

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Proceedings Article | 9 March 2023 Presentation

Optically-interconnected, hardware-efficient, electronic-photonic neural network using compact multi-operand photonic devices

Chenghao Feng, Rongxing Tang, Jiaqi Gu, Hanqing Zhu, David Pan, Ray Chen

Proceedings Volume PC12427, PC1242702 (2023) https://doi.org/10.1117/12.2658041

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Proceedings Article | 5 March 2022 Presentation

Optoelectronically interconnected hardware-efficient deep learning using silicon photonic chips

Chenghao Feng, Jiaqi Gu, Hanqing Zhu, Zhoufeng Ying, Zheng Zhao, David Pan, Ray Chen

Proceedings Volume PC12007, PC1200702 (2022) https://doi.org/10.1117/12.2616217

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Proceedings Article | 5 March 2022 Presentation

Design and experimental demonstration of a hardware-efficient integrated optical neural network

Chenghao Feng, Jiaqi Gu, Hanqing Zhu, David Pan, Ray Chen

Proceedings Volume PC12005, PC120050E (2022) https://doi.org/10.1117/12.2610255

KEYWORDS: Neural networks, Integrated optics, Reliability, Optical components

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Proceedings Article | 5 March 2021 Presentation

Wavelength-division-multiplexing-based electronic-photonic integrated circuits for high-performance data processing and transportation

Chenghao Feng, Zhoufeng Ying, Zheng Zhao, Jiaqi Gu, David Pan, Ray Chen

Proceedings Volume 11690, 116900R (2021) https://doi.org/10.1117/12.2578016

KEYWORDS: Electronic circuits, Data processing, Integrated circuits, Photonic integrated circuits, Field programmable gate arrays, Artificial intelligence, Multiplexing, Light wave propagation, Electrons, Data acquisition

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Proceedings Article | 5 March 2021 Presentation

Scalable fast-Fourier-transform-based (FFT-based) integrated optical neural network for compact and energy-efficient deep learning

Chenghao Feng, Jiaqi Gu, Zhoufeng Ying, Zheng Zhao, David Pan, Ray Chen

Proceedings Volume 11690, 116900I (2021) https://doi.org/10.1117/12.2578009

KEYWORDS: Neural networks, Integrated optics, Photonic integrated circuits, Machine learning, Thermography, Singular optics, Resonators, Reliability, Phase shifts, Optical components

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Proceedings Article | 9 March 2020 Presentation

Wavelength-division-multiplexing-based electronic-photonic network for high-speed computing (Conference Presentation)

Chenghao Feng, Zhoufeng Ying, Zheng Zhao, Jiaqi Gu, David Pan, Ray Chen

Proceedings Volume 11284, 112840H (2020) https://doi.org/10.1117/12.2551323

KEYWORDS: High speed electronics, Optical computing, Integrated photonics, Ultrafast phenomena, Multiplexing, Photonic integrated circuits, Bosons, Active optics, Computer architecture, Wavelength division multiplexing

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SPIE Journal Paper | 18 November 2019

SoulNet: ultrafast optical source optimization utilizing generative neural networks for advanced lithography

Ying Chen, Yibo Lin, Lisong Dong, Tianyang Gai, Rui Chen, Yajuan Su, Yayi Wei, David Pan

JM3, Vol. 18, Issue 04, 043506, (November 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.4.043506

KEYWORDS: Lithography, Model-based design, Optimization (mathematics), Neural networks, Data modeling, Machine learning, Photomasks, Mathematical modeling, Ultrafast phenomena, Source mask optimization

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SPIE Journal Paper | 22 March 2019

Lithography hotspot detection using a double inception module architecture

Jing Chen, Yibo Lin, Yufeng Guo, Maolin Zhang, Mohamed Baker Alawieh, David Pan

JM3, Vol. 18, Issue 01, 013507, (March 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013507

KEYWORDS: Lithography, Convolution, Feature extraction, Manufacturing, Neural networks, Data modeling, Performance modeling, Fuzzy logic, Process modeling, Design for manufacturability

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Proceedings Article | 4 March 2019 Paper

Automated logic synthesis for electro-optic computing in integrated photonics

Zhoufeng Ying, Zheng Zhao, Chenghao Feng, Rohan Mital, Shounak Dhar, David Pan, Ray Chen

Proceedings Volume 10924, 109240H (2019) https://doi.org/10.1117/12.2510363

KEYWORDS: Modulators, Logic, Optical computing, Electro optics, Integrated photonics, Logic devices, Signal processing, Integrated optics, Computer architecture, Optical circuits

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SPIE Journal Paper | 23 March 2018

Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly

Joydeep Mitra, Andres Torres, Yuansheng Ma, David Pan

JM3, Vol. 17, Issue 01, 013508, (March 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.013508

KEYWORDS: Directed self assembly, Connectors, Global Positioning System, Curium, Model-based design, Detection and tracking algorithms, Calibration, Monte Carlo methods, Data modeling, Failure analysis

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Proceedings Article | 14 March 2018 Presentation

Silicon-photonics-based carry-ripple adder towards future optical computing (Conference Presentation)

Zheng Wang, Zhoufeng Ying, Shounak Dhar, Zheng Zhao, David Pan, Ray Chen

Proceedings Volume 10537, 105370E (2018) https://doi.org/10.1117/12.2288748

KEYWORDS: Silicon photonics, Optical computing, Optical switching, Electronics, Optical logic, Signal processing, Computer architecture, Modulation

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Proceedings Article | 14 March 2018 Presentation

Microresonator-based electro-optic full adder for optical computing in integrated photonics (Conference Presentation)

Zhoufeng Ying, Zheng Wang, Shounak Dhar, Zheng Zhao, David Pan, Ray Chen

Proceedings Volume 10538, 1053803 (2018) https://doi.org/10.1117/12.2288543

KEYWORDS: Optical computing, Microresonators, Electro optics, Integrated photonics, Optical interconnects, Optical design, Telecommunications, Optical logic, Silicon photonics, Logic devices

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Proceedings Article | 16 October 2017 Presentation + Paper

Machine learning for mask/wafer hotspot detection and mask synthesis

Yibo Lin, Xiaoqing Xu, Jiaojiao Ou, David Pan

Proceedings Volume 10451, 104510A (2017) https://doi.org/10.1117/12.2282943

KEYWORDS: Machine learning, Optical proximity correction, SRAF, Feature extraction, Model-based design, Photomasks, Lithography, Data modeling, Neural networks, Printing

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SPIE Journal Paper | 14 June 2017

Triple/quadruple patterning layout decomposition via linear programming and iterative rounding

Yibo Lin, Xiaoqing Xu, Bei Yu, Ross Baldick, David Pan

JM3, Vol. 16, Issue 02, 023507, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023507

KEYWORDS: Electron beam lithography, Extreme ultraviolet lithography, Computer programming, Lithography, Metals, Semiconductors, Directed self assembly, Manufacturing, Photomasks

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Proceedings Article | 30 March 2017 Presentation + Paper

SOCS based post-layout optimization for multiple patterns with light interference prediction

Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Pan

Proceedings Volume 10148, 101480A (2017) https://doi.org/10.1117/12.2260091

KEYWORDS: SRAF, Lithography, Optical lithography, Semiconducting wafers, Wafer-level optics, Photovoltaics, Optical proximity correction, Image processing, Constructive interference, Destructive interference

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Proceedings Article | 28 March 2017 Presentation + Paper

Efficient DSA-DP hybrid lithography conflict detection and guiding template assignment

Jiaojiao Ou, Brian Cline, Greg Yeric, David Pan

Proceedings Volume 10148, 101480C (2017) https://doi.org/10.1117/12.2258156

KEYWORDS: Directed self assembly, Error analysis, Nano opto mechanical systems, Computer simulations, Optical proximity correction, Lithography, Double patterning technology, Optical lithography, Photomasks, Shape analysis

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Proceedings Article | 21 March 2017 Paper

Model-based guiding pattern synthesis for on-target and robust assembly of via and contact layers using DSA

Joydeep Mitra, Andres Torres, Yuansheng Ma, David Pan

Proceedings Volume 10144, 1014414 (2017) https://doi.org/10.1117/12.2257314

KEYWORDS: Calibration, Printing, Resolution enhancement technologies, Monte Carlo methods, Lithography, Model-based design, Optimization (mathematics), Detection and tracking algorithms, Directed self assembly, Connectors, Photomasks, Optical lithography

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Proceedings Article | 21 March 2017 Presentation + Paper

Process, design rule, and layout co-optimization for DSA based patterning of sub-10nm Finfet devices

Joydeep Mitra, Andres Torres, David Pan

Proceedings Volume 10144, 101440G (2017) https://doi.org/10.1117/12.2257313

KEYWORDS: Directed self assembly, Optical lithography, Monte Carlo methods, Photomasks, Manufacturing, Lithography, Double patterning technology, Printing, Optics manufacturing, Chemical analysis, Global Positioning System, Resolution enhancement technologies, Composites

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SPIE Journal Paper | 21 October 2016

Laplacian eigenmaps- and Bayesian clustering-based layout pattern sampling and its applications to hotspot detection and optical proximity correction

Tetsuaki Matsunawa, Bei Yu, David Pan

JM3, Vol. 15, Issue 04, 043504, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043504

KEYWORDS: Source mask optimization, Optical proximity correction, Data modeling, Lithography, Feature extraction, Principal component analysis, Model-based design, Performance modeling, Photomasks, Manufacturing

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Proceedings Article | 22 March 2016 Paper

Hybrid hotspot detection using regression model and lithography simulation

Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Pan

Proceedings Volume 9781, 97810C (2016) https://doi.org/10.1117/12.2219318

KEYWORDS: Lithography, Computer simulations, 193nm lithography, Feature extraction, Simulation of CCA and DLA aggregates, Semiconducting wafers, Manufacturing, Etching, Scanning electron microscopy, Photomasks

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Proceedings Article | 16 March 2016 Paper

Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding

Yibo Lin, Xiaoqing Xu, Bei Yu, Ross Baldick, David Pan

Proceedings Volume 9781, 97810M (2016) https://doi.org/10.1117/12.2218628

KEYWORDS: Lithography, Manufacturing, Metals, Semiconductors, New and emerging technologies, Directed self assembly, Silicon carbide

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Proceedings Article | 15 March 2016 Paper

Standard cell pin access and physical design in advanced lithography

Xiaoqing Xu, Brian Cline, Greg Yeric, David Pan

Proceedings Volume 9780, 97800P (2016) https://doi.org/10.1117/12.2222289

KEYWORDS: Lithography, Optical lithography, Design for manufacturability, Computational lithography, Optical tracking, Standards development, Metals, Design for manufacturing, Photomasks, 193nm lithography, Legal, Double patterning technology

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SPIE Journal Paper | 11 March 2016

Optical proximity correction with hierarchical Bayes model

Tetsuaki Matsunawa, Bei Yu, David Pan

JM3, Vol. 15, Issue 02, 021009, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021009

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Performance modeling, Statistical modeling, Simulation of CCA and DLA aggregates, Lithography, Feature extraction, Monte Carlo methods, Optics manufacturing

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SPIE Journal Paper | 3 February 2016

Systematic framework for evaluating standard cell middle-of-line robustness for multiple patterning lithography

Brian Cline, Greg Yeric, Bei Yu, David Pan, Xiaoqing Xu

JM3, Vol. 15, Issue 02, 021202, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021202

KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

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SPIE Journal Paper | 7 August 2015

Directed self-assembly cut mask assignment for unidirectional design

Jiaojiao Ou, Bei Yu, Jhih-Rong Gao, David Pan

JM3, Vol. 14, Issue 03, 031211, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031211

KEYWORDS: Photomasks, Lithography, Metals, Manufacturing, Source mask optimization, Computer programming, Electron beam lithography, Binary data, Fourier transforms, Directed self assembly

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Proceedings Article | 18 March 2015 Paper

Optical proximity correction with hierarchical Bayes model

Tetsuaki Matsunawa, Bei Yu, David Pan

Proceedings Volume 9426, 94260X (2015) https://doi.org/10.1117/12.2085787

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Statistical modeling, Performance modeling, Feature extraction, Simulation of CCA and DLA aggregates, Lithography, Monte Carlo methods, Statistical analysis

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Proceedings Article | 18 March 2015 Paper

A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extraction

Tetsuaki Matsunawa, Jhih-Rong Gao, Bei Yu, David Pan

Proceedings Volume 9427, 94270S (2015) https://doi.org/10.1117/12.2085790

KEYWORDS: Lithography, Feature extraction, Data modeling, Machine learning, Lawrencium, Manufacturing, Detection and tracking algorithms, Design for manufacturing, Calibration, Performance modeling

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Proceedings Article | 18 March 2015 Paper

A systematic framework for evaluating standard cell middle-of-line (MOL) robustness for multiple patterning

Xiaoqing Xu, Brian Cline, Greg Yeric, Bei Yu, David Pan

Proceedings Volume 9427, 942707 (2015) https://doi.org/10.1117/12.2085918

KEYWORDS: Optical lithography, Standards development, 193nm lithography, Photomasks, Lithography, Double patterning technology, Legal, Logic, Design for manufacturability, Manufacturing

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SPIE Journal Paper | 4 December 2014

Self-aligned double-patterning layout decomposition for two-dimensional random metals for sub-10-nm node design

Yongchan Ban, David Pan

JM3, Vol. 14, Issue 01, 011004, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011004

KEYWORDS: Photomasks, Metals, Lithography, Optical lithography, Double patterning technology, Semiconducting wafers, Manufacturing, Logic, Optical proximity correction, Lithographic illumination

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SPIE Journal Paper | 4 November 2014

Triple patterning lithography layout decomposition using end-cutting

Bei Yu, Subhendu Roy, Jhih-Rong Gao, David Pan

JM3, Vol. 14, Issue 01, 011002, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011002

KEYWORDS: Photomasks, Lithography, Optical lithography, Computer programming, Electron beam lithography, Manufacturing, Image processing, Double patterning technology, Logic

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SPIE Journal Paper | 4 November 2014

Accurate lithography hotspot detection based on principal component analysis-support vector machine classifier with hierarchical data clustering

Bei Yu, Jhih-Rong Gao, Duo Ding, Xuan Zeng, David Pan

JM3, Vol. 14, Issue 01, 011003, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011003

KEYWORDS: Lithography, Data modeling, Principal component analysis, Calibration, Performance modeling, Manufacturing, Data processing, Computer programming, Data compression, Dimension reduction

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Proceedings Article | 8 October 2014 Paper

Layout compliance for triple patterning lithography: an iterative approach

Bei Yu, Gilda Garreton, David Pan

Proceedings Volume 9235, 923504 (2014) https://doi.org/10.1117/12.2066034

KEYWORDS: Optical lithography, Double patterning technology, Lithography, Electron beam lithography, Photomasks, Computer aided design, Computer programming, Logic, Semiconductors, Extreme ultraviolet

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Proceedings Article | 28 March 2014 Paper

Accurate lithography hotspot detection based on PCA-SVM classifier with hierarchical data clustering

Jhih-Rong Gao, Bei Yu, David Pan

Proceedings Volume 9053, 90530E (2014) https://doi.org/10.1117/12.2045888

KEYWORDS: Data modeling, Lithography, Principal component analysis, Calibration, Machine learning, Performance modeling, Manufacturing, Data processing, Data centers, Design for manufacturing

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Proceedings Article | 28 March 2014 Paper

Bridging the gap from mask to physical design for multiple patterning lithography

Bei Yu, Jhih-Rong Gao, Xiaoqing Xu, David Pan

Proceedings Volume 9053, 905308 (2014) https://doi.org/10.1117/12.2048626

KEYWORDS: Optical lithography, Lithography, Photomasks, 193nm lithography, Electron beam lithography, Double patterning technology, Manufacturing, Bridges, Design for manufacturability, Metals

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Proceedings Article | 29 March 2013 Paper

Self-aligned double patterning compliant routing with in-design physical verification flow

Jhih-Rong Gao, Harshdeep Jawandha, Prasad Atkar, Atul Walimbe, Bikram Baidya, Olivier Rizzo, David Pan

Proceedings Volume 8684, 868408 (2013) https://doi.org/10.1117/12.2013245

KEYWORDS: Lithography, Double patterning technology, Photomasks, Manufacturing, Overlay metrology, 193nm lithography, Metals, Design for manufacturability, Detection and tracking algorithms, Design for manufacturing

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Proceedings Article | 29 March 2013 Paper

Triple patterning lithography (TPL) layout decomposition using end-cutting

Bei Yu, Jhih-Rong Gao, David Pan

Proceedings Volume 8684, 86840G (2013) https://doi.org/10.1117/12.2011355

KEYWORDS: Photomasks, Lithography, Electron beam lithography, Computer programming, Bridges, Manufacturing, Extreme ultraviolet lithography, Optical lithography, Logic, Solids

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Proceedings Article | 29 March 2013 Paper

Self-aligned double patterning friendly configuration for standard cell library considering placement impact

Jhih-Rong Gao, Bei Yu, Ru Huang, David Pan

Proceedings Volume 8684, 868406 (2013) https://doi.org/10.1117/12.2011660

KEYWORDS: Double patterning technology, Standards development, Manufacturing, Photomasks, Computer aided design, Antimony, Lithography, Design for manufacturability, Overlay metrology, Process control

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Proceedings Article | 7 March 2012 Open Access

Implications of triple patterning for 14nm node design and patterning

Kevin Lucas, Chris Cork, Bei Yu, Gerard Luk-Pat, Ben Painter, David Pan

Proceedings Volume 8327, 832703 (2012) https://doi.org/10.1117/12.920028

KEYWORDS: Optical lithography, Photomasks, Logic, Lithography, Double patterning technology, Etching, Immersion lithography, Cadmium sulfide, Metals, Dielectrics

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Proceedings Article | 23 February 2012 Paper

Fabrication and characterization of parallel-coupled dual racetrack silicon microresonators

Ryan Integlia, Lianghong Yin, Duo Ding, David Pan, Douglas Gill, Weiwei Song, Ying Qian, Wei Jiang

Proceedings Volume 8266, 82660M (2012) https://doi.org/10.1117/12.908601

KEYWORDS: Silicon, Resonators, Microresonators, Waveguides, Oxides, Optical fabrication, Electron beam lithography, Etching, Quadrature amplitude modulation, Optical fabrication equipment

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Proceedings Article | 2 February 2012 Paper

Low-power integration of on-chip nanophotonic interconnect for high-performance optoelectrical IC

Duo Ding, David Pan

Proceedings Volume 8267, 82670Z (2012) https://doi.org/10.1117/12.913886

KEYWORDS: Wavelength division multiplexing, Channel projecting optics, Nanophotonics, Waveguides, Modulators, Thermography, Signal attenuation, Reliability, Computer aided design, Copper

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Proceedings Article | 4 April 2011 Paper

Layout decomposition of self-aligned double patterning for 2D random logic patterning

Yongchan Ban, Alex Miloslavsky, Kevin Lucas, Soo-Han Choi, Chul-Hong Park, David Pan

Proceedings Volume 7974, 79740L (2011) https://doi.org/10.1117/12.879500

KEYWORDS: Photomasks, Metals, Lithography, Optical lithography, Logic, Etching, Double patterning technology, Manufacturing, Semiconducting wafers, Lithographic illumination

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SPIE Journal Paper | 1 October 2010

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations

Yongchan Ban, Yuangsheng Ma, Harry Levinson, David Pan

JM3, Vol. 9, Issue 04, 041211, (October 2010) https://doi.org/10.1117/12.10.1117/1.3504697

KEYWORDS: Resistance, Lithography, TCAD, Manufacturing, Design for manufacturability, Line edge roughness, Instrument modeling, Optical lithography, Edge roughness, Critical dimension metrology

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SPIE Journal Paper | 1 October 2010

Electrical impact of line-edge roughness on sub-45-nm node standard cells

Yongchan Ban, Savithri Sundareswaran, David Pan

JM3, Vol. 9, Issue 04, 041206, (October 2010) https://doi.org/10.1117/12.10.1117/1.3500746

KEYWORDS: Line edge roughness, Lithography, Diffusion, Device simulation, TCAD, Image segmentation, Nano opto mechanical systems, Transistors, Etching, Silicon

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Proceedings Article | 3 April 2010 Paper

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations in 32-nm node standard cell

Yongchan Ban, Yuansheng Ma, Harry Levinson, Yunfei Deng, Jongwook Kye, David Pan

Proceedings Volume 7641, 76410D (2010) https://doi.org/10.1117/12.846654

KEYWORDS: Resistance, Lithography, TCAD, Optical lithography, Line edge roughness, Critical dimension metrology, Manufacturing, Device simulation, Edge roughness, Optical proximity correction

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Proceedings Article | 13 March 2009 Paper

Electrical impact of line-edge roughness on sub-45nm node standard cell

Yongchan Ban, Savithri Sundareswaran, Rajendran Panda, David Pan

Proceedings Volume 7275, 727518 (2009) https://doi.org/10.1117/12.814355

KEYWORDS: Line edge roughness, Lithography, Diffusion, Ions, TCAD, Image segmentation, Critical dimension metrology, Device simulation, Transistors, Scanning electron microscopy

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Proceedings Article | 17 October 2008 Paper

Enhanced DCT2-based inverse mask synthesis with initial SRAF insertion

Shanhu Shen, Peng Yu, David Z. Pan

Proceedings Volume 7122, 712241 (2008) https://doi.org/10.1117/12.801409

KEYWORDS: Photomasks, SRAF, Lithography, Optical proximity correction, Semiconducting wafers, Binary data, Resolution enhancement technologies, Mathematical modeling, Berkelium, Manufacturing

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SPIE Journal Paper | 1 July 2007

True process variation aware optical proximity correction with variational lithography modeling and model calibration

Peng Yu, Sean Shi, David Pan

JM3, Vol. 6, Issue 03, 031004, (July 2007) https://doi.org/10.1117/12.10.1117/1.2752814

KEYWORDS: Optical proximity correction, Lithography, Photomasks, Calibration, Critical dimension metrology, Photoresist materials, Convolution, Systems modeling, Data modeling, Image processing

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Proceedings Article | 28 March 2007 Paper

Fast predictive post-OPC contact/via printability metric and validation

Peng Yu, David Pan

Proceedings Volume 6520, 652045 (2007) https://doi.org/10.1117/12.717194

KEYWORDS: Critical dimension metrology, Optical proximity correction, Lithography, Cesium, Detection and tracking algorithms, Manufacturing, Photoresist materials, Computer simulations, Photomasks, Image processing

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Proceedings Article | 14 March 2006 Paper

Fast lithography simulation under focus variations for OPC and layout optimizations

Peng Yu, David Pan, Chris Mack

Proceedings Volume 6156, 615618 (2006) https://doi.org/10.1117/12.658110

KEYWORDS: Lithography, Optical proximity correction, Computer simulations, Artificial intelligence, Image analysis, Systems modeling, Critical dimension metrology, Finite element methods, Lithographic illumination, Binary data

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Proceedings Article | 6 December 2004 Paper

A multi-objective floorplanner for shuttle mask optimization

Gang Xu, Ruiqi Tian, David Pan, Martin Wong

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569345

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Manufacturing, Chemical mechanical planarization, Algorithms, Very large scale integration, Wafer manufacturing, Computer programming

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