Mr. David Trost Profile

David Trost

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 11 March 2002 Paper

100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology

Frank Abboud, Ki-Ho Baik, Varoujan Chakarian, Damon Cole, Jay Daniel, Robert Dean, Mark Gesley, Robert Naber, Thomas Newman, Frederick Raymond, David Trost, Mark Wiltse, William DeVore

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.491928

KEYWORDS: Photomasks, Optical proximity correction, Raster graphics, Optical lithography, Electron beam lithography, Edge roughness, Lithography, Model-based design, Point spread functions, Photoresist processing

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Proceedings Article | 22 January 2001 Paper

Lithographic performance results for a new 50-kV electron-beam mask writer

Varoujan Chakarian, Stephen Bylciw, Charles Sauer, David Trost, Marek Zywno, Robin Teitzel, Frederick Raymond, Frank Abboud

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410672

KEYWORDS: Photomasks, Lithography, Electron beam lithography, RGB color model, Control systems, Composites, Optical proximity correction, Binary data, Raster graphics, Modulation

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Proceedings Article | 21 July 2000 Paper

Carbon fiber composite photomask stage component

Brian Catanzaro, Jack Dyer, David Trost

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390103

KEYWORDS: Composites, Electron beam lithography, Photomasks, Semiconducting wafers, Carbon, Manufacturing, Lithography, Reticles, Interfaces, Metals

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Proceedings Article | 21 July 2000 Paper

Initial benchmarking of a new electron-beam raster pattern generator for 130-100 nm maskmaking

Charles Sauer, Frank Abboud, Sergey Babin, Varoujan Chakarian, Abe Ghanbari, Robert Innes, David Trost, Frederick Raymond

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390065

KEYWORDS: Photomasks, Lithography, Raster graphics, Critical dimension metrology, Photoresist processing, Control systems, Scattering, Modulation, Reticles, Electron beam lithography

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Proceedings Article | 19 July 2000 Paper

Elements of an advanced pattern generator for 130- to 100-nm maskmaking

Varoujan Chakarian, Charles Sauer, Bassam Shamoun, Frank Chilese, David Trost, Marek Zywno, Ulrich Hofmann, Robin Teitzel, Richard Prior, Frederick Raymond, Abe Ghanbari, Frank Abboud

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392094

KEYWORDS: Photomasks, Lithography, Control systems, Electron beam lithography, Critical dimension metrology, Raster graphics, Reticles, Binary data, Line edge roughness, RGB color model

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Proceedings Article | 5 July 2000 Paper

Predictive and corrective model for bulk heating distortion in photomasks

Bassam Shamoun, David Trost, Frank Chilese

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389053

KEYWORDS: Distortion, Superposition, Photomasks, Electron beam lithography, Computer simulations, Data modeling, Thermal modeling, Optical lithography, Systems modeling, Astatine

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Proceedings Article | 30 December 1999 Paper

System architecture choices for an advanced mask writer (100 to 130 nm)

Varoujan Chakarian, Frederick Raymond, Charles Sauer, Sergey Babin, Robert Innes, Allan Sagle, Ulrich Hofmann, Bassam Shamoun, David Trost, Abe Ghanbari, Frank Abboud

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373318

KEYWORDS: Vestigial sideband modulation, Photomasks, Raster graphics, Lithography, Electron beam lithography, Optical proximity correction, Control systems, RGB color model, Photoresist processing, Reticles

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