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Two approaches will be discussed in this paper. First is magnetron sputtering of thin film iridium using Ion beam figuring (IBF) of a thick silicon oxide layer on the back surface derived algorithmically from optical metrology data to compensate the residual stresses from the imperfections of the sputter coating process. Second is the application of thin coating using atomic layer deposition (ALD), a process that is uniform at the atomic layer. Results of experiments from both processes will be presented, showing that either process is suitable for future x-ray telescopes, with the ALD process being preferable for its consistent higher performance and simplicity.
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