Mr. Dean J. Dawson Profile

Dean J. Dawson

Vice President, Marketing and Business Development at Photothermal Spectroscopy Corp

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Author

Publications (9)

Proceedings Article | 22 May 2009 Paper

Enabling accurate gate profile control with inline 3D-AFM

Tianming Bao, Andrew Lopez, Dean Dawson

Proceedings Volume 7378, 73781G (2009) https://doi.org/10.1117/12.824203

KEYWORDS: Metrology, 3D metrology, Line width roughness, Transmission electron microscopy, Etching, Critical dimension metrology, Line edge roughness, 3D modeling, Process control, Transistors

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Proceedings Article | 24 March 2009 Paper

Applications of AFM in semiconductor R&D and manufacturing at 45 nm technology node and beyond

Moon-Keun Lee, Minjung Shin, Tianming Bao, Chul-Gi Song, Dean Dawson, Dong-Chul Ihm, Vladimir Ukraintsev

Proceedings Volume 7272, 72722R (2009) https://doi.org/10.1117/12.813389

KEYWORDS: Metrology, Atomic force microscopy, Critical dimension metrology, Silicon, Transmission electron microscopy, Transistors, Photomasks, Process control, Image processing, Optical filters

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Proceedings Article | 1 December 2008 Paper

Improving sidewall profile metrology with enhanced 3D-AFM

Tianming Bao, Lars Mininni, Dean Dawson

Proceedings Volume 7140, 71400H (2008) https://doi.org/10.1117/12.804482

KEYWORDS: Metrology, Atomic force microscopy, Line width roughness, Line edge roughness, Scanners, Critical dimension metrology, Actuators, Silicon, Profiling, 3D metrology

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Proceedings Article | 20 August 2004 Paper

OPC development: variable CD-SEM bias through feature shape, feature density, and material composition

Kirk Miller, Katsuhiro Matsuyama, Ingo Schmitz, Dean Dawson

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557810

KEYWORDS: Optical proximity correction, Etching, 3D metrology, Metrology, Atomic force microscopy, Photomasks, Logic, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 20 August 2004 Paper

Application of atomic force microscope to 65-nm node photomasks

Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Katsuhiro Matsuyama, Dean Dawson

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557763

KEYWORDS: Photomasks, Metrology, Atomic force microscopy, Critical dimension metrology, 3D metrology, Microscopes, Atomic force microscope, Contamination, Chromium, Semiconductors

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Proceedings Article | 24 May 2004 Paper

Characterization and control of sub-100-nm etch and lithography processes using atomic force metrology

Kirk Miller, Vincent Geiszler, Dean Dawson

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533524

KEYWORDS: Etching, Metrology, 3D metrology, Semiconducting wafers, Critical dimension metrology, Lithography, Atomic force microscopy, Silicon, Algorithm development, Logic

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Proceedings Article | 16 July 2002 Paper

Die-scale wafer flatness: 3D imaging across 20 mm with nanometer-scale resolution

Kirk Miller, David Fong, Dean Dawson, Bradley Todd

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473527

KEYWORDS: Semiconducting wafers, Metrology, Chemical mechanical planarization, Copper, Image resolution, Logic, System on a chip, Optical lithography, Stereoscopy, Lithography

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Proceedings Article | 3 September 1999 Paper

Characterization of the CMP process by atomic force profilometry

Larry Ge, Dean Dawson

Proceedings Volume 3882, (1999) https://doi.org/10.1117/12.361298

KEYWORDS: Copper, Chemical mechanical planarization, Semiconducting wafers, Profiling, Atomic force microscopy, Metrology, Image resolution, 3D metrology, Dielectrics, Manufacturing

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Proceedings Article | 29 March 1999 Paper

TIS, AFM, interferometry, and optical profiler correlation of surface roughness on silicon wafers

Patrick Taylor, Dean Dawson

Proceedings Volume 3619, (1999) https://doi.org/10.1117/12.343707

KEYWORDS: Semiconducting wafers, Atomic force microscopy, Wafer-level optics, Silicon, Interferometry, Interferometers, Surface roughness, Manufacturing, Integrated optics, Polishing

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Showing 5 of 9 publications

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