Deep Panjwani
R & D Photo-Lithography Engineer at Micron Technology
SPIE Involvement:
Author
Area of Expertise:
Lithography , Optics , Sensors , Plasmonics , Nano Particles , Infrared Coatings
Websites:
Profile Summary

Micron Technology is a global leader in manufacturing of DRAM, NAND, NOR Flash memories and now extending its business in consumer products such as SSDs and USB Storage Drives (e.g. Crucial and Ballistix).

– Owning Front End of the Line (FEOL) critical modules for development of next generation NAND FLASH memory at R&D head quarter in Boise (FAB 4).
– Optimize cell yield improvements, failure analysis, and device performance through 365, 248 nm and state of the art immersion lithography techniques.
– Provide Process Integration Solutions & perform Statistical Analysis using Pandas Data Frame on Python. Perform Design of Experiments (DOE) and theoretical simulations (such as Monte Carlo) to predict potential yield in FLASH memory manufacturing. Micron Technology is a global leader in manufacturing of DRAM, NAND, NOR Flash memories and now extending its business in consumer products such as SSDs and USB Storage Drives (e.g. Crucial and Ballistix).

– Owning Front End of the Line (FEOL) critical modules for development of next generation NAND FLASH memory at R&D head quarter in Boise (FAB 4).
– Optimize cell yield improvements, failure analysis, and device performance through 365, 248 nm and state of the art immersion lithography techniques.
– Provide Process Integration Solutions & perform Statistical Analysis using Pandas Data Frame on Python. Perform Design of Experiments (DOE) and theoretical simulations (such as Monte Carlo) to predict potential yield in FLASH memory manufacturing.
Publications (9)

Proceedings Article | 4 September 2015 Paper
Proc. SPIE. 9617, Unconventional Imaging and Wavefront Sensing 2015
KEYWORDS: Oxides, Prisms, Surface plasmon polaritons, Capacitors, Graphene, Sensors, Metals, Silicon, Transmittance, Molybdenum

Proceedings Article | 1 September 2015 Presentation + Paper
Proc. SPIE. 9544, Metamaterials, Metadevices, and Metasystems 2015
KEYWORDS: Metamaterials, Infrared imaging, Mid-IR, Thin films, Diffraction, Metals, Microscopy, Dielectrics, Infrared radiation, Absorption

Proceedings Article | 8 June 2015 Paper
Proc. SPIE. 9451, Infrared Technology and Applications XLI
KEYWORDS: Bolometers, Long wavelength infrared, Gold, Mid-IR, Silica, Sensors, Coating, Reflectivity, Signal detection, Absorption

Proceedings Article | 24 June 2014 Paper
Proc. SPIE. 9070, Infrared Technology and Applications XL
KEYWORDS: Bolometers, Gold, Vanadium, Signal to noise ratio, Modulation, Sensors, Resistance, Black bodies, Temperature metrology, Plasma

Proceedings Article | 3 June 2014 Paper
Proc. SPIE. 9085, Sensors and Systems for Space Applications VII
KEYWORDS: Chalcogenide glass, Thin films, Refractive index, Antireflective coatings, Glasses, Silicon, Reflectivity, Chalcogenides, Infrared radiation, Thin film coatings

Showing 5 of 9 publications
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