Dr. Deirdre L. Olynick Profile

Dr. Deirdre L. Olynick

at Univ. of California

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 12 May 2020 Open Access

Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum)

Lauren Otto, Aeron Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre Olynick, Scott Dhuey, Bethanie Stadler, Adam Schwartzberg

Proceedings Volume 9919, 991918 (2020) https://doi.org/10.1117/12.2573754

KEYWORDS: Atomic layer deposition, Plasmonics, Tin, Nanophotonics, Plasma, Gases

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Proceedings Article | 16 October 2017 Presentation

A novel route to EUV resists design: Fundamental understanding of chemical processes (Conference Presentation)

Oleg Kostko, Bo Xu, Daniel Slaughter, Musahid Ahmed, D. Frank Ogletree, Kristi Closser, David Prendergast, Patrick Naulleau, Deirdre Olynick, Paul Ashby, Yi Liu, William Hinsberg, Gregory Wallraff

Proceedings Volume 10450, 104500J (2017) https://doi.org/10.1117/12.2281520

KEYWORDS: Electrons, Molecules, Extreme ultraviolet, Photons, Extreme ultraviolet lithography, Photoresist materials

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New resists are needed to advance EUV lithography. Tailored design of efficient photoresist is impossible without fundamental understanding of EUV induced chemistry. Resists incorporating high cross-section elements efficiently utilize EUV photons via radiation absorption by core-level electrons, resulting in emission of primary electrons. However, this is only an initial step in the process. Auger emission, molecular fragmentation, and subsequent electron-resist interactions are also critical. Understanding all these steps is crucial to harness all the deposited energy for improved patterning results. In this work, we present recent results of multimodal experimental approaches to study photoresist materials. To build our grasp of EUV photochemistry from the ground up we aim for understanding the whole variety of processes happening after absorption of an EUV photon by a single building block of resist material – a resist molecule. Model photoresist constituent molecules functionalized with halogen atoms, are isolated in the gas phase and exposed to tunable EUV radiation from the Advanced Light Source, Berkeley Lab and the direct processes are investigated by photoelectron spectroscopy and photoionization mass spectrometry. We quantify the performance of several candidate molecules in terms of photoemission cross-sections and electron yield per primary photoionization event. We demonstrate that some prototype resist molecules can emit several (photo- and Auger) electrons after single EUV photon absorption. Following the electron emission, the atomic relaxation leads to the molecule fragmentation, which also depends on the halogen functionalization. Secondary electron-driven reactions are studied by tunable electron impact ionization and dissociative electron attachment mass spectrometry. We demonstrate that even very low kinetic energy electrons may lead to the molecule dissociation. While gas-phase studies do provide insight into the primary EUV photon or electron induced events in the individual resist molecules, we seek to understand these processes in the condensed phase as this is where industrially relevant processes will occur. We discuss techniques allowing for generation of resist nanoparticles of different morphology, representing either condensed resist or a substrate coated by a resist film. The same techniques, as applied to investigate resist’s building blocks, are used to study the condensed resist material, connecting our understanding of the fundamental phenomena from each isolated molecule to the solid state system.

Proceedings Article | 3 October 2016 Presentation + Paper

Plasma-enhanced atomic layer deposition for plasmonic TiN

Lauren Otto, Aeron Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre Olynick, Scott Dhuey, Bethanie J. H. Stadler, Adam Schwartzberg

Proceedings Volume 9919, 99190N (2016) https://doi.org/10.1117/12.2238340

KEYWORDS: Plasmonics, Metals, Atomic layer deposition, Plasma, Spectroscopic ellipsometry, Data modeling, Oxides, Plasma etching, Spectroscopy

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Proceedings Article | 20 March 2015 Paper

Revealing beam-induced chemistry using modulus mapping in negative-tone EUV/e-beam resists with and without cross-linker additives

Prashant Kulshreshtha, Ken Maruyama, Scott Dhuey, Dominik Ziegler, Weilun Chao, Paul Ashby, Deirdre Olynick

Proceedings Volume 9425, 94250I (2015) https://doi.org/10.1117/12.2086045

KEYWORDS: Electron beam lithography, Scanning electron microscopy, Scanning probe microscopy, Chemistry, Calibration, Line scan image sensors, Electron beams, Atomic force microscopy, Lithography, Line edge roughness

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SPIE Journal Paper | 5 September 2014

Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Nerea Alayo, David Gosselin, Marko Vogler, Deidre Olynick, Christophe Peroz, Stefano Cabrini

JM3, Vol. 13, Issue 03, 033013, (September 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.033013

KEYWORDS: Nanoimprint lithography, Metals, Multilayers, Etching, Polymethylmethacrylate, Optical lithography, Plasma, Ultraviolet radiation, Silicon films, Scanning electron microscopy

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Proceedings Article | 18 April 2013 Paper

Nanoscale modulus and surface chemistry characterization for collapse free resists

Prashant Kulshreshtha, Ken Maruyama, Sara Kiani, Dominik Ziegler, James Blackwell, Deidre Olynick, Paul Ashby

Proceedings Volume 8681, 86810O (2013) https://doi.org/10.1117/12.2011657

KEYWORDS: Atomic force microscopy, Neodymium, Chemistry, Scanning probe microscopy, Ions, Silicon, Scanning electron microscopy, Calibration, Extreme ultraviolet lithography, Transmission electron microscopy

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Proceedings Article | 29 March 2013 Paper

Sub-20nm lithography negative tone chemically amplified resists using cross-linker additives

Prashant Kulshreshtha, Ken Maruyama, Sara Kiani, Scott Dhuey, Pradeep Perera, James Blackwell, Deirdre Olynick, Paul Ashby

Proceedings Volume 8682, 86820N (2013) https://doi.org/10.1117/12.2011640

KEYWORDS: Line edge roughness, Molecules, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Image resolution, Electron beam lithography, Extreme ultraviolet, Chemically amplified resists, Image processing

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Proceedings Article | 10 January 2013 Paper

Formation of nanoscale structures by inductively coupled plasma etching

Colin Welch, Deirdre Olynick, Zuwei Liu, Anders Holmberg, Christophe Peroz, Alex P. Robinson, M. David Henry, Axel Scherer, Thomas Mollenhauer, Vince Genova, Doris K. Ng

Proceedings Volume 8700, 870002 (2013) https://doi.org/10.1117/12.2017609

KEYWORDS: Etching, Silicon, Photomasks, Ions, Plasma, Cryogenics, Polymers, Nanoimprint lithography, Silica, Chromium

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Proceedings Article | 9 October 2012 Paper

Signal propagation in dipole coupled nanomagnets for logic applications

David Carlton, Brian Lambson, Zheng Gu, Scott Dhuey, Li Gao, Brian Hughes, Deirdre Olynick, Charles Rettner, Andreas Scholl, Brian Youngblood, Anthony Young, Ilya Krivorotov, Stuart Parkin, Jeffrey Bokor

Proceedings Volume 8461, 84610W (2012) https://doi.org/10.1117/12.930776

KEYWORDS: Anisotropy, Magnetism, Logic, Crystals, Switching, Clocks, Transistors, Binary data, Nanolithography, Logic devices

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Proceedings Article | 3 April 2010 Paper

Nanoprobe maskless lithography

Ivo Rangelow, Tzvetan Ivanov, Yanko Sarov, Andreas Schuh, Andreas Frank, Hans Hartmann, Jens-Peter Zöllner, Dierdre Olynick, V. Kalchenko

Proceedings Volume 7637, 76370V (2010) https://doi.org/10.1117/12.852265

KEYWORDS: Scanning probe lithography, Lithography, Polymers, Molecules, Optical lithography, Polymer thin films, Scanning probe microscopy, Electron beam lithography, Nanoprobes, Maskless lithography

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Proceedings Article | 7 March 2007 Paper

Nanoscale pattern transfer for templates, NEMS, and nano-optics

Deirdre Olynick, J. Alexander Liddle, Bruce Harteneck, Stefano Cabrini, Ivo Rangelow

Proceedings Volume 6462, 64620J (2007) https://doi.org/10.1117/12.705033

KEYWORDS: Etching, Silicon, Ions, Nanoimprint lithography, Chemistry, Nanoelectromechanical systems, Nano optics, Plasma etching, Multiplexing, Photomasks

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Proceedings Article | 24 May 2004 Paper

CD metrology for the 45-nm and 32-nm nodes

Bryan Rice, Heidi Cao, Ovijut Chaudhuri, Michael Grumski, Bruce Harteneck, Alex Liddle, Deidre Olynick, Jeanette Roberts

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536071

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Metrology, Scatterometry, Silicon, Atomic force microscopy, Semiconductors, Manufacturing, Ion beams

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Proceedings Article | 20 May 2004 Paper

Fabrication process of molecular memory circuits by nanoimprint lithography

Gun-Young Jung, S. Ganapathiappan, Xuema Li, Dougleas Ohlberg, Deidre Olynick, Yong Chen, Wei Wu, Shih-Yuan Wang, William Tong, R. Williams

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.540898

KEYWORDS: Electrodes, Nanoimprint lithography, Polymers, Titanium, Platinum, Polymer thin films, Polymethylmethacrylate, Lithography, Scanning electron microscopy, Nanowires

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Proceedings Article | 16 June 2003 Paper

Static EUV micro-exposures using the ETS Set-2 optics

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Christopher Walton, Donna O'Connell, Pei-Yang Yan, Guojing Zhang

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490129

KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

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Proceedings Article | 1 July 2002 Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, David Attwood, Phillip Batson, Jeffrey Bokor, Paul Denham, Eric Gullikson, Bruce Harteneck, Brian Hoef, Keith Jackson, Deirdre Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth Blaedel, Henry Chapman, Layton Hale, Regina Soufli, Eberhard Spiller, Donald Sweeney, John Taylor, Christopher Walton, Avijit Ray-Chaudhuri, Donna O'Connell, Richard Stulen, Daniel Tichenor, Charles Gwyn, Pei-yang Yan, Guojing Zhang

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318

KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

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Proceedings Article | 13 December 2001 Paper

Experimental analysis of high-resolution soft x-ray microscopy

Weilun Chao, Erik Anderson, Gregory Denbeaux, Bruce Harteneck, Angelic Pearson, Deirdre Olynick, Gerd Schneider, David Attwood

Proceedings Volume 4499, (2001) https://doi.org/10.1117/12.450231

KEYWORDS: Zone plates, X-rays, Microscopes, Gold, Plating, Scanning electron microscopy, X-ray imaging, Mirrors, Silicon, Nickel

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Proceedings Article | 8 November 2000 Paper

High-resolution soft x-ray microscopy

Weilun Chao, Erik Anderson, Gregory Denbeaux, Bruce Harteneck, Mark LeGros, Angelic Pearson, Deirdre Olynick, David Attwood

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406671

KEYWORDS: Microscopes, Zone plates, X-rays, X-ray imaging, Scanning electron microscopy, X-ray microscopy, Objectives, Lenses, Mirrors, Nanofabrication

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Showing 5 of 17 publications

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