Deog-Bae Kim
at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 23 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Optical lithography, Deep ultraviolet, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Glasses, X-rays, Reflectivity, Extreme ultraviolet, Line width roughness, Chemical analysis, Extreme ultraviolet lithography, Molecular interactions

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Carbon, Lithography, Refractive index, Ultraviolet radiation, Silicon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

Proceedings Article | 3 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Polymerization, Line width roughness, Palladium, Promethium, Immersion lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Polymer thin films

Proceedings Article | 23 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Reflectivity, Image resolution, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Showing 5 of 24 publications
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