Derk Brouns
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 21 November 2023 Presentation + Paper
Derk Brouns, Christian Cloin, Tahmid Hossain, Elena Nedanovska
Proceedings Volume 12751, 127510L (2023) https://doi.org/10.1117/12.2682101
KEYWORDS: Reticles, Particles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D modeling, Data modeling, Systems modeling, Solid modeling, Semiconducting wafers

Proceedings Article | 27 June 2019 Paper
Derk Brouns, Par Broman, Jan-Willem van der Horst, Raymond Lafarre, Raymond Maas, Theo Modderman, Roel Notermans, Guido Salmaso
Proceedings Volume 11178, 1117806 (2019) https://doi.org/10.1117/12.2536344
KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Reflectivity, Extreme ultraviolet lithography, Reticles, Particles, Reflection, Scanners, Photomasks

Proceedings Article | 26 September 2016 Paper
Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Dennis de Graaf, Hilary Harrold, Piet Hennus, Paul Janssen, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Raymond Lafarre, Andrea Mancuso, David Ockwell, Daniel Smith, David van de Weg, Jim Wiley
Proceedings Volume 9985, 99850A (2016) https://doi.org/10.1117/12.2239882
KEYWORDS: Pellicles, Extreme ultraviolet, Reticles, Inspection, High volume manufacturing, Scanners, Particles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography

Proceedings Article | 18 March 2016 Paper
Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol
Proceedings Volume 9776, 97761Y (2016) https://doi.org/10.1117/12.2221909
KEYWORDS: Pellicles, Extreme ultraviolet, Imaging systems, Reticles, Optical lithography, Inspection, Scanners, High volume manufacturing, Particles, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks

Proceedings Article | 9 July 2015 Paper
Florian Dhalluin, Laurens de Winter, Luigi Scaccabarozzi, Jack Van der Sanden, Sven Lentzen, Rob Van Gils, Maurice Bogers, Erik Ruinemans, Derk Brouns, Juan Diego Arias Espinoza, Mária Péter, Daniel Smith, Wim Van der Zande, Hans Vermeulen
Proceedings Volume 9658, 96580J (2015) https://doi.org/10.1117/12.2197454
KEYWORDS: Pellicles, Reticles, Finite element methods, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Resistance, Semiconducting wafers, Protactinium

Showing 5 of 6 publications
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