Mr. Derk Brouns Profile

Derk Brouns

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 21 November 2023 Presentation + Paper

EUV reticle defectivity: next steps in the EUV scanner and beyond

Derk Brouns, Christian Cloin, Tahmid Hossain, Elena Nedanovska

Proceedings Volume 12751, 127510L (2023) https://doi.org/10.1117/12.2682101

KEYWORDS: Reticles, Particles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D modeling, Data modeling, Systems modeling, Solid modeling, Semiconducting wafers

Read Abstract +

Proceedings Article | 27 June 2019 Paper

ASML NXE pellicle update

Derk Brouns, Par Broman, Jan-Willem van der Horst, Raymond Lafarre, Raymond Maas, Theo Modderman, Roel Notermans, Guido Salmaso

Proceedings Volume 11178, 1117806 (2019) https://doi.org/10.1117/12.2536344

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Reflectivity, Extreme ultraviolet lithography, Reticles, Particles, Reflection, Scanners, Photomasks

Read Abstract +

Proceedings Article | 26 September 2016 Paper

NXE pellicle: development update

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Dennis de Graaf, Hilary Harrold, Piet Hennus, Paul Janssen, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Raymond Lafarre, Andrea Mancuso, David Ockwell, Daniel Smith, David van de Weg, Jim Wiley

Proceedings Volume 9985, 99850A (2016) https://doi.org/10.1117/12.2239882

KEYWORDS: Pellicles, Extreme ultraviolet, Reticles, Inspection, High volume manufacturing, Scanners, Particles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 18 March 2016 Paper

NXE pellicle: offering a EUV pellicle solution to the industry

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol

Proceedings Volume 9776, 97761Y (2016) https://doi.org/10.1117/12.2221909

KEYWORDS: Pellicles, Extreme ultraviolet, Imaging systems, Reticles, Optical lithography, Inspection, Scanners, High volume manufacturing, Particles, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks

Read Abstract +

Proceedings Article | 9 July 2015 Paper

Grid-supported EUV pellicles: A theoretical investigation for added value

Florian Dhalluin, Laurens de Winter, Luigi Scaccabarozzi, Jack Van der Sanden, Sven Lentzen, Rob Van Gils, Maurice Bogers, Erik Ruinemans, Derk Brouns, Juan Diego Arias Espinoza, Mária Péter, Daniel Smith, Wim Van der Zande, Hans Vermeulen

Proceedings Volume 9658, 96580J (2015) https://doi.org/10.1117/12.2197454

KEYWORDS: Pellicles, Reticles, Finite element methods, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Resistance, Semiconducting wafers, Protactinium

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Progress on EUV pellicle development

Carmen Zoldesi, Kursat Bal, Brian Blum, Guus Bock, Derk Brouns, Florian Dhalluin, Nina Dziomkina, Juan Diego Arias Espinoza, Joost de Hoogh, Silvester Houweling, Maarten Jansen, Mohammad Kamali, Alain Kempa, Ronald Kox, Robert de Kruif, Jorge Lima, Yang Liu, Henk Meijer, Hans Meiling, Ijen van Mil, Marco Reijnen, Luigi Scaccabarozzi, Daniel Smith, Beatrijs Verbrugge, Laurens de Winters, Xugang Xiong, John Zimmerman

Proceedings Volume 9048, 90481N (2014) https://doi.org/10.1117/12.2049276

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Reticles, Prototyping, Silicon, Manufacturing, Particles, Critical dimension metrology, Protactinium

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years