Mr. Derk Brouns Profile

Derk Brouns

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 27 June 2019 Paper

ASML NXE pellicle update

Derk Brouns, Par Broman, Jan-Willem van der Horst, Raymond Lafarre, Raymond Maas, Theo Modderman, Roel Notermans, Guido Salmaso

Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

KEYWORDS: Reticles, Reflection, Scanners, Particles, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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Proceedings Article | 26 September 2016 Paper

NXE pellicle: development update

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Dennis de Graaf, Hilary Harrold, Piet Hennus, Paul Janssen, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Raymond Lafarre, Andrea Mancuso, David Ockwell, Daniel Smith, David van de Weg, Jim Wiley

Proc. SPIE. 9985, Photomask Technology 2016

KEYWORDS: Reticles, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

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Proceedings Article | 18 March 2016 Paper

NXE pellicle: offering a EUV pellicle solution to the industry

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol

Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII

KEYWORDS: Reticles, Optical lithography, Imaging systems, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

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Proceedings Article | 9 July 2015 Paper

Grid-supported EUV pellicles: A theoretical investigation for added value

Florian Dhalluin, Laurens de Winter, Luigi Scaccabarozzi, Jack Van der Sanden, Sven Lentzen, Rob Van Gils, Maurice Bogers, Erik Ruinemans, Derk Brouns, Juan Diego Arias Espinoza, Mária Péter, Daniel Smith, Wim Van der Zande, Hans Vermeulen

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Reticles, Scanners, Particles, Resistance, Pellicles, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Protactinium

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Proceedings Article | 17 April 2014 Paper

Progress on EUV pellicle development

Carmen Zoldesi, Kursat Bal, Brian Blum, Guus Bock, Derk Brouns, Florian Dhalluin, Nina Dziomkina, Juan Diego Arias Espinoza, Joost de Hoogh, Silvester Houweling, Maarten Jansen, Mohammad Kamali, Alain Kempa, Ronald Kox, Robert de Kruif, Jorge Lima, Yang Liu, Henk Meijer, Hans Meiling, Ijen van Mil, Marco Reijnen, Luigi Scaccabarozzi, Daniel Smith, Beatrijs Verbrugge, Laurens de Winters, Xugang Xiong, John Zimmerman

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Reticles, Particles, Silicon, Manufacturing, Pellicles, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Prototyping, Protactinium

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