The future of mask industry technology is in flux. While the requirements for current and near-term lithographic capability is well understood, advanced lithography options pose a completely new set of challenges to the mask maker. Challenges are not only process and materials related, but also include more fundamental concerns dealing with how to afford the necessary capability development. This paper identifies the issues and attempts to propose solutions to the industry's growing concerns.
Extreme UVL (EUVL) is expected to meet the manufacturing lithography requirements of the 45 nm node and below. The manufacturer of 45 nm EUVL reticles will require advancement in both traditional mask production capabilities as well as requirements uniquely related to EUVL reticles. Photonics is actively pursuing EUVL reticle capability along two paths. First, the NGL Mask Center of Competency (MCoC) has been developing mask technology to support proximity x-ray, electron projection lithography (EPL) and EUVL for several years. The MCoC has applied high resolution lithography and pattern transfer processes developed for 125 nm and below 1X processes to 4X EUVL masks. In addition, the McoC is collaboration with suppliers on the development of low defect mask blanks and inspection techniques as well as developing low temperature chemically amplified resist processes and low stress materials deposition and processing specifically for EUVL mask fabrication. Key process technology including high resolution vector scan EB lithography and chemically amplified resist processes and has been transferred from the MCoC to manufacturing sites. Secondly, as a natural extension of the optical reticle product line, EUVL reticles will benefit from current and continued mask manufacturing development. Vector scan e-beam lithography with chemically amplified resists will be used at both the Photonics MCoC and manufacturing facilities to improve resolution and productivity for sub 100 nm reticle production.
Conference Committee Involvement (3)
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
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